Display panel manufacturing method, display panel, and display device

Abstract

The invention discloses a display panel manufacturing method, a display panel, and a display device. The method comprises the steps: forming a thin film transistor pattern, a grid line pattern and a data line pattern on a substrate, wherein the thin film transistor pattern comprises a connecting block connected with the drain electrode of a thin film transistor, and the connecting block is provided with a plurality of hollow-out structures; carrying out the exposing and developing processing of a negative photoresist layer at one side, backing on to the thin film transistor, of the substrate,and removing the non-exposed part of the negative photoresist layer; removing a pixel electrode layer which is not covered by the negative photoresist layer; removing the remaining negative photoresist layer, and forming a pixel electrode pattern. The thin film transistor pattern, the grid line pattern and the data line pattern are taken as the mask templates, and the pixel electrode pattern is formed in an autocollimation mode, thereby avoiding a collimation problem caused by the application of a mask, and causing no pattern offset. Meanwhile, the method saves the mask which is used for manufacturing a pixel electrode, thereby saving the production cost.

Description

Technical field [0001] The present invention relates to the field of display technology, in particular to a manufacturing method of a display panel, a display panel and a display device. Background technique [0002] Thin Film Transistor-Liquid Crystal Display (TFT-LCD) has the characteristics of small size, low power consumption, and no radiation, and it occupies a dominant position in the current flat panel display market. For the TFT-LCD, a large number of masks are required to adopt a thin film manufacturing process, and the mold of the mask has a high production cost, which is not conducive to improving and yielding efficiency. On the other hand, it is necessary to precisely align the composition position when using a mask to compose a picture. Otherwise, a lot of defects will occur due to the pattern shift. The prior art has a certain limit on the control of pattern alignment. Can not effectively avoid the problem of graphic offset. Summary of the invention [0003] Embodi...

AI Technical Summary

Problems solved by technology

For TFT-LCD, the thin film manufacturing process needs to use a large number of masks, and the mold of the mask has a high production cost, which is not conducive to improving production efficiency.

On the other hand, it is necessary to precisely align the composition position when using a mask to form a pattern, otherwise many defects will occur due to pattern offset, and there is a certain limit for the control of pattern alignment in the prior art, so Unable to effectively avoid the offset problem of graphics

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