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Liquid treatment device

A liquid treatment and treatment liquid technology, applied in the field of liquid treatment devices, can solve problems such as the temperature rise of treatment liquid, and achieve the effect of reducing thermal influence

Active Publication Date: 2022-05-31
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In such a case, there is the vicinity of the piping of the processing liquid used at high temperature. The problem of the temperature rise of the treatment liquid used in

Method used

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  • Liquid treatment device
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Embodiment Construction

[0026] Hereinafter, embodiments of the liquid processing apparatus disclosed in the present invention will be described in detail with reference to the accompanying drawings. In addition, the present invention is not limited

[0028] FIG. 1 is a diagram showing a schematic configuration of a substrate processing system according to the present embodiment. Below, in order to clarify the location

[0029] As shown in FIG. 1, a substrate processing system 1 includes an in-feed and out-feed station 2 and a processing station 3. Incoming and outgoing station 2 and processing station 3

[0030] The delivery station 2 includes a carrier mounting portion 11 and a transport portion 12. The carrier mounting portion 11 is mounted with a plurality of

[0031] The conveying unit 12 is provided adjacent to the conveying device placing unit 11, and has a substrate conveying device 13 and a transfer unit inside.

[0032] The processing station 3 is provided adjacent to the conveying section 12...

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PUM

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Abstract

A liquid processing apparatus according to an embodiment of the present invention includes a processing unit, a first supply channel, a first device, a second supply channel, a second device, a case, and an external case. The processing unit processes the substrate using a processing liquid. The first supply path supplies the first processing liquid to the processing unit. The first device supplies the first processing liquid to the first supply channel. The second supply path supplies a second processing liquid that is higher in temperature than the first processing liquid to the processing unit. The second device is for supplying the second processing liquid to the second supply channel. The housing accommodates the handling unit. The outer case is adjacent to the case and accommodates the first device and the second device. In addition, the external case has a partition wall between the first device and the second device.

Description

Liquid treatment device technical field [0001] Embodiments of the present invention relate to liquid processing apparatuses. Background technique [0002] In the prior art, there are known liquid processing apparatuses for liquid processing substrates such as semiconductor wafers, glass substrates, and the like. [0003] In a liquid processing apparatus, a plurality of pipes for supplying a processing liquid are arranged in a concentrated area in a relatively narrow area. Case. In such a case, there is near the piping of the processing liquid used at high temperature, and there is at room temperature and low temperature When piping of the processing liquid used, it is used at room temperature and low temperature due to heat dissipation from the piping of the processing liquid used in high temperature The problem of the temperature rise of the processing liquid used. Therefore, in recent years, it has been proposed to house a plurality of liquid processing units in a p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/304H01L21/027H01L21/306
CPCH01L21/67051H01L21/6708H01L21/6719H01L21/67017H01L21/67178H01L21/6704H01L21/67098H01L21/6715H01L21/67253H01L21/67276
Inventor 入山哲郎梅野慎一高木康弘佐藤尊三
Owner TOKYO ELECTRON LTD
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