Method for acidic copper plating of hardware
A technology of acid copper plating and hardware, applied in electrolytic components, cells, electrolytic process, etc., to achieve the effect of improving copper plating speed, shortening plating time, and fast deposition speed
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[0011] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in combination with the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0012] The invention provides a technical solution: a method for acidic copper plating of hardware, the copper plating raw materials are as follows: the mass number of copper sulfate is 250g / L; the mass number of sulfuric acid is 70g / L; the mass number of chloride ions is 35mg / L; The concentration and volume of BFJ-210Mμ is 7.5ml / L; the concentration and volume of BFJ-210A is 0.8ml / L; the concentration and volume of BFJ-210B is 0.8ml / L; the cathode current density is 6A / dm 2 ; Anode current ...
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