An electrowetting display device and its preparation method
An electro-wetting display and electro-wetting technology, applied in the directions of instruments, optical components, optics, etc., can solve the problems of easy ink overturning, uneven pixel opening, poor effect, etc., so as to improve the display effect and avoid oil film overturning. wall, the effect of improving the display effect
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Embodiment 1
[0039] see Figure 4 , the present embodiment provides an electrowetting display device, including two supporting plates up and down, and a polar liquid 8 and a non-polar liquid 7 encapsulated therein by a plastic frame 9, and the non-polar liquid 7 is usually ink , the upper support plate includes an upper substrate 1 and an electrode layer 2, the lower support plate includes a lower substrate 3, an electrode layer 4, a hydrophobic layer 5, a pixel wall 6 and a columnar structure 10 arranged on the hydrophobic layer 5; the electrode layer 4 is provided with an opening 11, the pixel wall 6 encloses a pixel grid, and the columnar structure 10 is located in the pixel grid.
[0040]The position of the columnar structure 10 is preferably located in the corner area of the pixel grid adjacent to the opening 11, which is surrounded by a horizontal and vertical symmetry line passing through the center of the pixel and two pixel walls surrounding the opening structure, accounting for...
Embodiment 2
[0051] see Figure 9 , the present embodiment provides an electrowetting display device, including two supporting plates up and down, and a polar liquid 8 and a non-polar liquid 7 encapsulated therein by a plastic frame 9, and the non-polar liquid 7 is usually ink , the lower support plate includes a lower substrate 3, an electrode layer 4 and an insulating layer 15 above it, a hydrophobic layer 5, and a pixel wall 6 and a columnar structure 10 arranged on the hydrophobic layer 5 arranged in sequence, and the pixel wall 6 encloses a pixel grid , the columnar structure 10 is located in the pixel grid, and the upper support plate includes an upper substrate 1 and an electrode layer 2 .
[0052] The columnar structures 10 and the insulating layer 15 are formed of insulating materials, preferably prepared by photolithography using a non-conductive photoresist material. The material of the photoresist may be the same as that of the photoresist of the pixel wall, or may be a differ...
Embodiment 3
[0060]The method and steps in this embodiment are basically the same as in Embodiments 1-2, the difference is that the pixel wall 6 and the columnar structure 10 are manufactured separately by two-step photolithography, so different materials can be used to set the pixel wall 6 and the column shaped structure 10, the height and hydrophilicity and hydrophobicity of the pixel wall 6 and the columnar structure 10 can be different, in order to increase the resolution of the electrowetting display device, the height of the columnar structure can be reduced, preferably, the columnar structure The height is 1 / 5 to 1 of the height of the pixel wall, more preferably 1 / 5 to 1 / 2 of the height of the pixel wall. At the same time, since different materials can be used, the hydrophilicity of the columnar structure 10 and the pixel wall 6 It can be different. The columnar structure 10 is made of a material with higher hydrophobicity. The ink is not easy to move to the pixel wall 6, and it is ...
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Abstract
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