Method for regenerating TiN process Ti material part of film fabrication of semiconductor 8-inch wafer manufacturing

Abstract

The invention discloses a method for regenerating a TiN process Ti material part of film fabrication of semiconductor 8-inch wafer manufacturing. The method comprises the following steps (1) under normal pressure, after pure water or ultra-pure water is heated, hot water is fed into a high-pressure water pump and us sprayed on all parts of the surface of the Ti material part, and the water pressure is not less than 85 bar; (2) the Ti material part is dried by using hot air; (3) under normal pressure, as natural cooling is carried out, a dry ice jetting machine is used, dry ice particles are sprayed to all parts of the Ti material parts at a high speed, and the jetting speed is 870-1000 m / s; and (4) after dry-ice jetting is finished, the temperature naturally returns to the room temperature, and then washing is carried out. According to the method, the steps are concise, but the processing effect is magical, an excellent impurity falling and cleaning effect can be obtained in a relatively short time, moreover, the water flushing pressure and the dry ice quenching are both in the titanium material bearing range, and therefore, the regeneration of the Ti material photoelectric part becomes simple and feasible.

Description

technical field [0001] The invention belongs to the technical field of photoelectric cleaning, in particular to a method for regenerating parts made of Ti material in the TiN process of the thin film manufacturing process of semiconductor 8-inch wafers. Background technique [0002] Components used in the field of semiconductor technology often have high requirements for cleanliness, and tiny impurities will affect the performance of semiconductors. As non-consumable core parts that can be used for a long time, it is impossible to replace them when they are still usable, and the cost is too high. Instead, cleaning and cleaning technologies are used to regenerate semiconductor parts, and the regenerated parts can be put into use repeatedly , basically no impact on performance. [0003] The traditional cleaning is organic chemical solvents or reagents to dissolve and post-treat organic residues; or use auxiliary high-pressure water blasting cleaning, etc. But the former will...

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Problems solved by technology

But the former will pollute the environment, and the latter will damage the surface coating of the parts themselves