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Washing device and method, developing system and method

A cleaning device and development system technology, applied in the development field, can solve the problems that the development device is prone to developing defects, etc., and achieve the effects of reducing the occurrence of development graphic defects, improving product yield, and reducing transfer

Inactive Publication Date: 2018-10-30
HUAIAN IMAGING DEVICE MFGR CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the technical solution of the present invention is that the existing developing device of the approaching developing nozzle is extremely prone to developing defects

Method used

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  • Washing device and method, developing system and method
  • Washing device and method, developing system and method
  • Washing device and method, developing system and method

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Embodiment Construction

[0029] In the prior art, in the developing device close to the nozzle, in order to reduce the consumption of the developer and improve the effect of CD uniformity, the nozzle (nozzle) with a long nozzle closer to the surface of the wafer (Wafer) is adopted. However, in the development in the process, such as figure 1 As shown, since the nozzle hole 22 is closer to the surface of the wafer 4, surface tension is easily generated when the developer is sprayed, and the fine particle residue 8 (particle) generated after the reaction between the developer and the photoresist is attached to the surface through the counterflow of the surface tension. On the nozzle 2, the nozzle 2 is polluted, and the polluted nozzle 2 will bring the particle residue to the wafer when the developer is sprayed on the subsequent wafer, so that the wafer is contaminated and causes the pattern defect of the development. It affects the development effect of subsequent wafers and greatly reduces the product ...

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Abstract

The technical scheme of the invention discloses a washing device and method and a developing system and method. The washing device comprises a tank body, a cover body, a sensor, an air shower end, a liquid supply end, a liquid discharge end, an exhaust port and an exhaust end, wherein the tank body is used for accommodating the nozzle assembly of a developing device, the nozzle assembly comprisesa developing liquid supply and temperature control cavity and a nozzle attached to the bottom of the cavity, and the interior of the tank body is provided with a cavity placing area and a nozzle washing area; the cover body is arranged on the top of the tank body; the sensor is used for sensing the nozzle so as to control the cover body to be opened or closed; the air shower end is arranged in thecavity placing area; the liquid supply end and the liquid discharge end are arranged at the positions, corresponding to the nozzle washing area, on the side walls of the tank body respectively; and the exhaust port and the exhaust end are arranged at the bottom of the tank body. Through the technical scheme, the developing defects generated in the subsequent developing process are reduced, and the product yield is improved.

Description

technical field [0001] The invention belongs to the technical field of developing, and in particular relates to a cleaning device, a cleaning method using the cleaning device, a developing system including the cleaning device, and a developing method using the developing system. Background technique [0002] Development is an important step in the integrated circuit manufacturing process. In the semiconductor photolithography process, the photoresist is coated, baked, exposed, developed and other steps to form a photolithographic pattern. Among them, the development process is the process of using the developer to spray and infiltrate the wafer (Wafer) to remove the exposed photoresist on the wafer, and it is a reuse process for controlling the formation of photolithographic patterns. [0003] However, although the existing developing device close to the developing nozzle can reduce the consumption of developing solution and has good effects such as CD uniformity, it is very...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/30B08B3/12B08B3/08
CPCB08B3/08B08B3/12G03F7/3057
Inventor 沈雪刘庆超颜廷彪柯汎宗黄志凯
Owner HUAIAN IMAGING DEVICE MFGR CORP
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