Nanoimprint replica mold, manufacturing method therefor, and nanoimprint replica mold manufacturing device
A technology of nanoimprinting and transfer printing, which is applied in the direction of nanostructure manufacturing, photolithographic process exposure device, nanotechnology, etc., which can solve the problems of high manufacturing unit price, complicated manufacturing process, and low pattern accuracy, and achieve low manufacturing unit price and high manufacturing efficiency. The effect of simple process and improved precision
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[0026] The purpose, specific advantages and new features of the present invention will become easier to understand in the following detailed description and embodiments described in conjunction with the accompanying drawings. It should be noted that, when assigning reference numerals to constituent elements in each figure in this specification, even if the same constituent elements are indicated in different drawings, the same numerals should be assigned as much as possible. Also, although the terms first, second, etc. may be used to describe various constituent elements, the constituent elements are not limited to the terms. The terms are used only for the purpose of distinguishing one constituent element from another constituent element. In addition, in describing the present invention, when it is judged that the specific description of the related known technology would unnecessarily obscure the gist of the present invention, the detailed description will be omitted.
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