Retaining wall structure, color filter array substrate and liquid crystal display panel

Abstract

The present invention provides a retaining wall structure, comprising a first color-resist layer, a second color-resist layer and an insulating layer, the first color-resist layer and the second color-resist layer are arranged in the non-display area on the edge of the color filter array substrate, and the color filter The array substrate also includes a display area, the non-display area surrounds the periphery of the display area, the first color-resist layer and the second color-resist layer are stacked on the substrate of the color filter array substrate, and the insulating layer is arranged on the substrate and covers the first color filter layer. The resistance layer and the second color resistance layer are respectively provided with a first light-shielding layer and a second light-shielding layer on the insulating layers on both sides of the first color resistance layer and the second color resistance layer. In the direction perpendicular to the substrate, the second light-shielding layer The height of the first light-shielding layer and the second light-shielding layer is lower than the height of the superposition of the first color-resist layer, the second color-resist layer and the insulating layer, which solves the partial problems existing in the prior art while improving the accuracy of the PI liquid coating boundary. The problem of light leakage defects. The invention also provides a color filter array substrate and a liquid crystal display panel.

Description

technical field [0001] The invention belongs to the technical field of liquid crystal display, and in particular relates to a retaining wall structure, a color filter array substrate and a liquid crystal display panel. Background technique [0002] In liquid crystal display technology, with the continuous development of material technology, new panel materials have greatly promoted the improvement of product technology and production efficiency. At present, a new process developed by the industry uses black organic photoresist produced by one process to replace the traditional two processes of BM (black matrix, black matrix) and PS (photo spacer, spacer). This technology is named BCS (Black Colum Spacer) or BPS (Black Photo Spacer), etc. [0003] Due to the poor stability of the process for preparing BPS with a gray-tone mask and the narrow process window, the single-tone mask and the conventional mask manufacturing process have great development prospects. Since the mask ...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a retaining wall structure to solve the problem of local light leakage defects in the retaining wall set up in the prior art to control the boundary accuracy of PI liquid coating

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