A preparation method of a spliced ​​transparent conductive film electrode and its products

Abstract

The invention discloses a spliced ​​transparent conductive thin film electrode, which is characterized in that the spliced ​​transparent conductive thin film electrode is sequentially arranged from top to bottom: a thin film electrode layer, an adhesive layer, and a base layer; the thin film electrode layer is composed of several sheets Formed by splicing transparent conductive films, the width of the splicing gap between adjacent transparent conductive films is less than 2 mm, and the splicing gap is filled with conductive paste, so that the transparent conductive films can completely achieve electrical conduction. In the present invention, without changing the preparation process of the existing conductive film, the area of ​​the film can be further enlarged by splicing the film electrodes, and the preparation process is simple, and large-scale mass production can be realized.

Description

technical field [0001] The invention relates to a preparation method of a transparent electrode, in particular to a preparation method of a spliced ​​transparent conductive film electrode. Background technique [0002] Transparent electrodes are a kind of special electrode materials with high light transmittance and high conductivity, which are widely used in many fields such as photonic information technology, optoelectronic technology, new energy, and national defense and military affairs. With the development of science and technology, people have higher and higher requirements for electronic devices, and electronic devices have begun to develop towards flexibility and ultra-thinness, thus making flexible transparent conductive films a new favorite of transparent electrodes. Transparent conductive film usually refers to a film with an average light transmittance of more than 80% for visible light (wavelength 380-780nm) and a resistance of less than 10-3Ωcm. Due to its own...

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Problems solved by technology

[0004] No matter what kind of transparent conductive film, it is currently facing great difficulties to achieve mass production of electrodes with high conductivity and large size (area resistance lower than 30Ω∕□)

For example: for the low-resistance ITO conductive film, once the preparation area is enlarged, its conductive uniformity will be greatly different, and the amount of its target material will also increase greatly, and its preparation cost is extremely high, and it is usually difficult to realize the market. For example: the new silver nanowire conductive film, due to the significant difference in the fluidity of its conductive ink coated on the film substrate with a large width, the preparation area is often difficult to exceed 1.2 meters; for example: metal mesh Grid transparent conductive film, as a high-conductivity film, once the width exceeds 80cm, the yield rate will be greatly reduced, and there will be defects such as grid disconnection and glue opening, so it is not mass-producible, so the current market The commonly used metal grid conductive film is usually less than 50cm in width

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