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A kind of X-ray layered multilayer film grating structure with inclined side wall

A grating structure and multi-layer film technology, applied in radiation/particle processing, using aperture/collimator, applying diffraction/refraction/reflection for processing, etc., can solve collapse damage, affect optical performance, poor mechanical stability, etc. problem, to achieve the effect of suppressing vibration, improving spectral purity and high resolution

Active Publication Date: 2020-07-28
TONGJI UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the development of high-resolution and high-efficiency layered multilayer film gratings requires the production of a multilayer film stack structure with a width of about 100nm, an aspect ratio greater than 10, and vertical sidewalls, which poses a high challenge to the manufacturing process.
The mechanical stability of this layered structure with a large aspect ratio is also poor, and it may collapse and be damaged during fabrication and subsequent applications, seriously affecting the actual optical performance.

Method used

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  • A kind of X-ray layered multilayer film grating structure with inclined side wall
  • A kind of X-ray layered multilayer film grating structure with inclined side wall
  • A kind of X-ray layered multilayer film grating structure with inclined side wall

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Embodiment Construction

[0033] The present invention will be described in detail below with reference to the drawings and specific embodiments. This embodiment is implemented on the premise of the technical solution of the present invention, and a detailed implementation mode and specific operation process are given, but the protection scope of the present invention is not limited to the following embodiments.

[0034] The embodiment of the present invention provides a Tilted Lamellar Multilayer Gratings (TLMG) with inclined sidewalls, which is suitable for use as a high-efficiency and high-resolution spectroscopic monochromator in X-ray spectroscopy experiments. Such as figure 2 As shown, the grating structure includes periodic multilayer film stacks 3, the formed grating period is D, the center position of the multilayer film stack 3 coincides with the center position of each grating period, and the multi-layer film stack 3 has a duty ratio from the top It increases monotonously to the bottom, and th...

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Abstract

The invention relates to a sidewall inclined X-ray layered multilayer film grating structure comprising periodically distributed multilayer film stacks. The central position of the multilayer film stacks coincides with the central position of each grating period, and the wide ratio of the multilayer film stacks monotonically increases from the top to the bottom, wherein the wide ratio refers to the ratio of the lateral width of the multilayer film stacks to the grating period at any height position of the multilayer film stacks, and the thickness of the periodic film layers also monotonicallyvaries from the surface to the substrate. Compared with the structures in the prior art, the shortcomings of the conventional sidewall vertical high-aspect-ratio layered multilayer film grating structure that is difficult to manufacture and poor in mechanical stability can be overcome, the stability and the service life of the grating elements can be remarkably improved and the highest efficiencyof the grating remains unchanged; besides, the film stack structure of which the upper part is narrow and the lower part is wide can further improve the effective penetration depth of X-rays so that higher resolution and spectral purity can be obtained. The structure can be used as the key reflective element for high-resolution X-ray spectrum measurement.

Description

Technical field [0001] The invention belongs to the technical field of multilayer film reflective elements, and relates to an X-ray multilayer film grating element, in particular to a sidewall inclined X-ray layered multilayer film grating structure. Background technique [0002] X-ray spectroscopy technology is an important method for analyzing information such as material composition, atomic structure and electronic valence. It has important applications in materials science, astrophysics, life science and other fields. The X-ray monochromator is a key element in the X-ray spectrometer, and its spectral resolution determines the detection accuracy of the material composition and structure. [0003] In the hard X-ray band, natural crystal is a good monochromatic element, but due to the limitation of the crystal plane spacing, it is difficult to apply to the soft X-ray band. Multilayer film is an extension of natural crystal in the middle and low energy range. As a one-dimensional...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21K1/02G21K1/06
CPCG21K1/02G21K1/062
Inventor 黄秋实王占山蒋励张众
Owner TONGJI UNIV
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