Thin film deposition method and josephson junction preparation method

A thin film deposition, superconducting thin film technology, applied in the manufacture/processing of superconducting devices, superconducting devices, electrical components, etc., can solve the problem of low film performance, Josephson junction leakage current, and difficulty in obtaining roughness of superconducting thin films at the same time and stress and other issues to achieve the effect of improving performance, improving performance and stability, and avoiding leakage current.

Inactive Publication Date: 2019-01-25
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a thin film deposition method and a Josephson junction preparation method for solving the difficulty in obtaining i

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  • Thin film deposition method and josephson junction preparation method
  • Thin film deposition method and josephson junction preparation method
  • Thin film deposition method and josephson junction preparation method

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Embodiment 1

[0040] Before adopting the thin film deposition method of the present invention for thin film deposition, a very important preliminary work is to characterize the stress and roughness of single-layer thin film deposition, and obtain the curve diagram of stress and roughness changing with deposition conditions, such as figure 1 As shown, the schematic diagram of the stress and roughness of the niobium film changing with the deposition conditions is the inventor's long-term research work, after a long period of analysis, repeated experiments and constant adjustment of deposition parameters and finally obtained, according to This curve is a schematic diagram. In the process of actually preparing a superconducting thin film, suitable deposition conditions can be selected according to the performance parameters of the superconducting thin film to be prepared. In this embodiment, an exemplary description will be given to the deposition method of the niobium film according to the sche...

Embodiment 2

[0059] The present invention also provides a method for preparing a Josephson junction, comprising the steps of:

[0060] 1) providing a substrate;

[0061] 2) depositing a superconducting thin film layer on the surface of the substrate;

[0062] 3) depositing an insulating layer on the lower superconducting thin film layer;

[0063] 4) depositing a superconducting thin film layer on the insulating layer;

[0064] Wherein, at least one of the lower superconducting thin film layer and the upper superconducting thin film layer is formed by the thin film deposition method as described in Embodiment 1, that is, the lower superconducting thin film layer and the upper superconducting thin film layer At least one of the two conductive thin film layers is deposited by the stepwise deposition method shown in Embodiment 1, and preferably both are formed by the thin film deposition method in Embodiment 1. By depositing the same film several times, a film that meets the requirements in...

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Abstract

The invention provides a thin film deposition method and a Josephson junction preparation method. A method for depositing a thin film comprises that step of: 1) providing a substrate; 2) depositing afirst superconducting thin film layer have a first stress on that surface of the substrate under a first deposition condition; 3) depositeing a second superconducting thin film layer have a second stress on that surface of the first superconducting thin film layer under a second deposition condition, wherein the thickness and the material of the first superconducting thin film lay and the second superconducting thin film layer are the same, and the first stress is opposite to the direction of the second stress. The thin film is deposited by a step-by-step deposition method, the final preparedthin film meet the requirements in stress and roughness at the same time, and the performance and stability of the superconducting circuit device are improved. The Josephson junction prepared by the Josephson junction preparation method of the invention can effectively avoid the generation of leakage current and improve the performance of the Josephson junction.

Description

technical field [0001] The invention relates to the field of superconducting device preparation, in particular to a film deposition method and a Josephson junction preparation method. Background technique [0002] Superconducting circuits include single flux quantum devices (SFQ), superconducting quantum interference devices (SQUID) and other circuits using superconducting Josephson junctions. Among them, single flux quantum devices (Single Flux Quantum, SFQ) use Josephson junctions A single magnetic flux quantum to represent the superconducting circuit technology of logic "1" and "0". The clock frequency of the superconducting digital circuit based on this can reach 770GHz, which can be used for ultra-wideband analog-to-digital / digital-to-analog conversion in radar and communication systems devices, broadband network switches, digital autocorrelators for radio astronomy, and superconducting computers. Because of its advantages of fast speed and low power consumption, the U...

Claims

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Application Information

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IPC IPC(8): H01L39/24
CPCH10N60/0912
Inventor 吴禹应利良任洁王镇
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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