Photomask used for preparing liner-type BPS and liquid crystal display panel

A liquid crystal display panel and gasket technology, which is applied in the direction of originals for photomechanical processing, optics, and optomechanical equipment. It can solve the problems of large film thickness, small step difference, and affecting the range of liquid crystals, and achieve large step differences. Effect

Active Publication Date: 2019-02-01
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF5 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, due to metal reflection, the film thickness of the color-resist liner 402 of the auxiliary spacer is greater than expected, resulting in a smaller final stage difference and affecting the liquid crystal range.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photomask used for preparing liner-type BPS and liquid crystal display panel
  • Photomask used for preparing liner-type BPS and liquid crystal display panel
  • Photomask used for preparing liner-type BPS and liquid crystal display panel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] Figure 6AShown is a top view of a conventional photomask 40 for making a pad-type BPS, Figure 6B is a top view of the color-resist pattern corresponding to the application of the photomask 40, Figure 6C It is a cross-sectional view of the main spacer color resist liner 41 formed by using the photomask 40 . The photomask 40 is provided with a liner pattern 42 for forming the color-resist liner 41 of the main spacer, and the liner pattern 42 is a large-opening light-transmitting area; the photomask 40 further includes an RGB color-resist pattern 43 for forming an RGB color-resist 44. The RGB color resist pattern 43 is a light-transmitting area with a large opening. The existing RGB color-resist pattern 43 and spacer pattern 42 are designed to be light-transmitting as a whole, that is, the light transmittance T=100%, and the height of the color-resist liner 41 of the main spacer formed on the substrate 100 is H.

[0038] Figure 6D It is a top view of the mask 50 of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a photomask used for preparing a liner-type BPS and a liquid crystal display panel. The photomask is provided with a liner pattern for forming a main photo spacer color resistance liner; wherein the liner pattern includes a light transmitting zone and a shading pattern, having a small key dimension, arranged in the light transmitting zone; the shading pattern having a small key dimension is a regular pattern, which is enough small in linearity in one characteristic direction; the key dimension is not more than 5 [mu]m. The invention also provides a LCD panel. The photomask can increase the segment difference conversion rate in subsequent coating steps on the BPS material and finally can up-adjust the practical segment difference between the main photo spacer and asub photo spacer. The liner-type BPS of the LCD panel has a large segment difference.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a photomask and a liquid crystal display panel for making a pad type BPS. Background technique [0002] Liquid Crystal Display (LCD) has many advantages such as thin body, power saving, and no radiation, and has been widely used, such as: LCD TV, smart phone, digital camera, tablet computer, computer screen, or notebook computer Screens, etc., dominate the field of flat panel displays. [0003] BPS (Black Photo Spacer) technology integrates two independent processes of black matrix (BM) and spacer (PS) in conventional LCD into one, and uses black light-shielding photosensitive resin to form three functional structures with different heights, from high to low They are the main spacer (Main PS) / auxiliary spacer (Sub PS) and the black matrix, forming a variety of steps. figure 1 and figure 2 Shown are two main structural designs of the BPS technology in the prior art. Different...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/26G02F1/13G02F1/1339G02F1/1333
CPCG02F1/1303G02F1/1333G02F1/13394G03F1/26G02F1/133357G02F1/13396G02F1/13398G03F7/0007G03F1/32G02F1/133512G02F1/133514G02F1/1368
Inventor 曹武
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap