Double work-piece stage exchanging device based on single/double drive stepping scanning, and method thereof

Abstract

The invention relates to a double work-piece stage exchanging device based on single / double drive stepping scanning, and a method thereof, and belongs to the technical field of semiconductor manufacturing equipment. The device comprises a base station, and work-piece stages, wherein the work-piece stages are respectively positioned on a pre-alignment working position and an exposure working position. 4 Y-direction linear movement units and 2 X-direction linear movement units are pre-arranged on a balancing mass block, and concurrently Y-direction transition linear movement units are arranged between the pre-alignment working position and the exposure working position. The movements of the work-piece stages between the pre-alignment area and the exposure area are completed through the docking of the linear motor stators of the Y-direction linear movement units and the Y-direction transition linear movement units so as to achieve the three-step work-piece stage exchanging. The first Y-direction linear motor mover is fixedly connected with the first work-piece stage, and the fourth Y-direction linear motor is fixedly connected with the second work-piece stage. According to the present invention, the three-step work-piece stage exchanging is adopted during the stage exchanging process so as to improve the stage exchanging efficiency; the device has characteristics of small movement inertia, short stabilization time, and avoidance of the clamp mechanism of the work-piece stage during the concrete device implementation process, and has advantages of compact structure, large structure stiffness, and the like.

Description

Technical field [0001] The invention belongs to semiconductor manufacturing equipment, and mainly relates to a dual-workpiece table exchange device and method based on single / dual drive step scanning. Background technique [0002] The lithography machine is one of the important ultra-precision system engineering equipment in semiconductor chip manufacturing. As the current mainstream lithography technology, the step-and-scan type puts forward higher requirements on the motion performance of the workpiece table. The main function of the workpiece stage is to carry the wafer under the conditions of high speed and high acceleration to realize nano-level positioning, complete the loading and unloading, pre-alignment, alignment and other processes in the photolithography process, and cooperate with the mask stage to complete the exposure action. Workpiece stage technology plays a vital role in improving the resolution, overlay accuracy and productivity of the lithography machine. [00...

AI Technical Summary

Problems solved by technology

In the patent CN101201555, the conveyor belt and the docking slider are used to complete the stage changing process, the movement rhythm is small, and the operation and maintenance are simple. However, the conveyor belt mechanism and the docking slider are fixed on the abutment, so there will be a large force during the stage changing process On the abutment, it has a great influence on the overall dynamic performance

In the patent CN1485694, the table-changing operation is completed by the docking of the Y-direction linear motor and the linear guide rail. However, due to the excessive gap in the middle of the abutment, a bridging device is introduced, which increases the movement rhythm and increases the time for table-changing. At the same time, the X-direction linear motor magnetically The steel part is fixed on the abutment, and the movement of the moving parts will generate a large reaction force on the abutment when the platform is changed, which in turn affects the dynamic performance of the entire system

In the patent CN101770181, the docking of the replacement unit is used to complete the work of changing the platform, but the guide device is fixed on the abutment. During the movement of changing the platform, the moving parts will generate a large reaction force on the abutment, which in turn affects the dynamic performance of the entire system.

Therefore, the current dual-platform solution needs to be improved.

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