Manufacturing method of array substrate

Abstract

The invention provides an array substrate manufacturing method, and the method comprises the steps: sequentially depositing a metal layer and an ITO (indium tin oxide) layer on a glass substrate, andperforming the first photoetching to form a first layer structure including a gate electrode and a storage capacitor electrode; sequentially depositing a gate insulating layer, an IGZO (indium galliumzinc oxide) semiconductor layer and a source / drain metal layer on the first layer structure, and performing the second photoetching to form a second layer structure which comprises a silicon island pattern, a source and a drain; sequentially forming a passivation layer and a planarization layer formed on the second layer structure, enabling the IGZO semiconductor layer to form a conductor IGZO inthe process of forming the passivation layer, and performing the third photoetching to form a conductive via hole; depositing a transparent conductive film on the planarization layer, and performingthe fourth photoetching to form a pixel electrode, and connecting the pixel electrode and the conductive via hole. The method can realize the fabrication of the array substrate with high transmittancepixels by only four mask process sequences.

Description

technical field [0001] The invention relates to the field of liquid crystal display, in particular to a method for manufacturing an array substrate. Background technique [0002] The transmittance of the liquid crystal display panel plays an extremely important role in the overall display performance of the liquid crystal display panel. The higher the transmittance, the higher the realism of the liquid crystal display panel, and the lower the brightness of the backlight source. In order to reduce the product cost, how to improve the transmittance of the liquid crystal display panel is a very important research topic. [0003] figure 1 A schematic diagram of the circuit design of the array substrate provided in the prior art, figure 2 for figure 1 The cross-sectional view of the array substrate shown in the A-A' direction, refer to figure 1 with figure 2 As shown, the manufacturing method of the array substrate provided by the prior art includes six photomasks in the p...

AI Technical Summary

Problems solved by technology

[0004] Although the six-mask process technology provided by the prior art can realize the transparency and high transmittance of the pixel electrode and the storage capacitor electrode, the process is complicated and the production cost is high.

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