Device and method for preparing large-sized uniform thin film by monitoring multi-point reflectivity

Abstract

The invention provides a device and method for preparing a large-size uniform thin film through multi-point reflectivity monitoring. The device and method are suitable for preparing the large-size uniform thin film on a large-size substrate through a multi-point reflectivity monitoring method. The reflectivity of multiple monitoring points is monitored in real time, the real-time change rate of the reflectivity is determined, an evaporation source is controlled to supplement the weak position through comparison of the points, and uniform evaporation of the whole film layer is completed by combining the preset value set initially. Compared with the traditional manner of adopting a thickness monitoring manner for film coating, according to the device and method for preparing the large-size uniform thin film through multi-point reflectivity monitoring, the reflectivity changes of various positions of a large-size product are monitored more directly in the film coating process, the problemthat uniformity of the large-size product cannot be evaluated by single-point measuring in the manufacturing process can be solved, and the production efficiency is improved.

Description

technical field [0001] The invention relates to the field of photoelectric multiplication technology, in particular to the preparation technology of a uniform film layer on the surface of a large-scale photocathode, and specifically relates to a device and method for preparing a large-scale uniform film by using multi-point reflectivity monitoring. Background technique [0002] Large-size uniform thin film preparation technology is widely used in optical coatings, material surface coatings, etc., and related products involve many fields of people's production and life. The preparation of large-size thin films mostly adopts various methods of coating and vacuum coating. In actual use, the parameters required for many large-scale coated products are actually optical parameters, such as reflectivity, transmittance, light absorption and so on. For transparent and translucent films, the production process can be monitored by optical means, which has the advantage of in-situ meas...

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Problems solved by technology

[0004] The purpose of the present invention is to provide a device and method for preparing a large-size uniform film by using multi-point reflectance monitoring, which can directly monitor the change of reflectivity at each position of a large-size product, and solve the problem that single-point measurement cannot evaluate large-size products during the manufacturing process uniformity problem

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