Fast value complement method for mosaic splicing

A mosaic and value compensation technology, which is applied to the original parts for photomechanical processing, photoplate process of pattern surface, optics, etc., can solve the problem that the machine cannot quickly adjust the compensation value, the splicing Mura phenomenon is aggravated, and the production efficiency is reduced. and other problems, to achieve the effect of improving the splicing Mura phenomenon, reducing the production process and production cost, and improving production efficiency

Active Publication Date: 2019-02-22
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Claims
  • Application Information

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Problems solved by technology

[0005] The present invention provides a fast compensation method for mosaic splicing, which can solve the problem that in the case of poor mosaic splicing accuracy, it is impossible to confirm which mosaic area the area with poor accuracy belongs to according to the graph, so the machine cannot perform fast Adjusting the compensation value leads to technical problems such as reduced production efficiency and aggravated splicing Mura phenomenon

Method used

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  • Fast value complement method for mosaic splicing
  • Fast value complement method for mosaic splicing
  • Fast value complement method for mosaic splicing

Examples

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Embodiment 1

[0043] Take the 8.5th generation line mask mosaic splicing as an example, such as Figure 5 , Image 6 , Figure 7 As shown, the present embodiment provides a fast compensation method for mosaic splicing. The marking method adopted in this embodiment is to design the smallest unit constituting the first mosaic area 11 as a special pattern, and the fast compensation method Specifically include the following steps:

[0044] S101: forming a first mosaic area 11 and a second mosaic area 12;

[0045]A first mosaic area 11 and a second mosaic area 12 are respectively formed, and the first mosaic area 11 and the second mosaic area 12 are complementary, so that a complete figure can be formed during subsequent splicing. Since there is a difference in alignment accuracy between the first mosaic area 11 and the second mosaic area 12, after the first mosaic area 11 and the second mosaic area 12 are formed, it is judged that the first mosaic area 11 , the contrast accuracy of the seco...

Embodiment 2

[0055] Take the 8.5th generation line mask mosaic splicing as an example, such as Figure 8 , Figure 9 , Figure 10 As shown, the present embodiment provides a fast compensation method for mosaic splicing. The marking method adopted in this embodiment is to design the smallest unit constituting the second mosaic area 22 as a special pattern, and the fast compensation method Specifically include the following steps:

[0056] S201: forming a first mosaic area 21 and a second mosaic area 22;

[0057] Such as Figure 9 As shown, a first mosaic area 21 and a second mosaic area 22 are respectively formed, and the first mosaic area 21 and the second mosaic area 22 are complementary, so that a complete figure can be formed during subsequent splicing. Since there is a difference in alignment accuracy between the first mosaic area 21 and the second mosaic area 22, after the first mosaic area 21 and the second mosaic area 22 are formed, it is judged that the first mosaic area 21 , ...

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Abstract

The present invention provides a fast value complement method for mosaic splicing. The method comprises the steps of S101, forming a first mosaic area and a second mosaic area; S102, designing minimumunits constituting the first mosaic area as special patterns to serve as marks; S103, conducting splicing and superimposing on the first mosaic area and the second mosaic area to form a third mosaicarea; S104, conducting identification according to the special patterns and distinguishing the relative positions of the first mosaic area and second mosaic area in a third mosaic area; S105, conducting value complement on splicing positions of the mosaic areas, with low alignment precision, identified in the third mosaic area, and finally forming the mosaic areas of a display panel. By designingthe special mosaic patterns, quick adjustment and value complement are achieved under the condition that the mosaic splicing precision is poor, a splicing Mura phenomenon is improved, the production efficiency is improved, and the manufacturing process and production cost of the liquid crystal panel are reduced.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a fast compensation method for mosaic splicing. Background technique [0002] Because large-size LCD TVs can bring more audio-visual impact, they are increasingly favored by LCD panel manufacturers. In the traditional 8.5-generation line to produce LCD panels larger than 55 inches, since the size of the panel is larger than the effective exposure area of ​​the photomask, photomask splicing technology is required. Mosaic splicing is a mask splicing technology that transforms sharp splicing lines into fuzzy splicing lines. Since the unevenness of the panel picture quality (Mura phenomenon) caused by mosaic splicing is relatively slight and there is no special functional requirement for the exposure machine, so in It has been widely used in the production of large-size panels. [0003] In the actual production process of traditional mosaic stitching, the two mosaic areas are comp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1333G03F1/38
CPCG02F1/1333G03F1/38
Inventor 戴文
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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