Disposable full-surface vapor deposition support, vapor deposition furnace and deposition method thereof
A vapor deposition and full-surface technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of increased deposition uniformity, increased deposition efficiency, and more covered areas, achieving improved Processing efficiency and output, high degree of automation, and the effect of reducing time costs
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[0048] Objects, advantages and features of the present invention will be illustrated and explained by the following non-limiting description of preferred embodiments. These embodiments are only typical examples of applying the technical solutions of the present invention, and all technical solutions formed by adopting equivalent replacements or equivalent transformations fall within the protection scope of the present invention.
[0049] The present invention discloses a disposable full-surface vapor deposition stent, as attached figure 2 As shown, it includes a coaxial first support 1 and a second support 2. At least one first support plane (not shown in the figure) for placing workpieces is formed on the first support 1. The second support 2 is formed with a second support plane (not shown in the figure) that matches and is coaxial with each first support plane, and the second support plane is also used to support the workpiece.
[0050] In the first state, each of the first...
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