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Method for improving large mold PVD film uniformity

A uniformity and mold technology, which is applied in the field of improving the uniformity of PVD film layers of large molds, can solve the problems of complex process and a lot of time, and achieve the effect of simple equipment.

Active Publication Date: 2019-04-05
INST OF MECHANICS - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method can achieve better coating uniformity in large-area magnetron sputtering, but the method is complex and requires a lot of time for pre-experimentation and adjustment

Method used

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  • Method for improving large mold PVD film uniformity
  • Method for improving large mold PVD film uniformity
  • Method for improving large mold PVD film uniformity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] In the ABC type of the large triangular mold base, A, B and C respectively correspond to the three vertices of the triangle, and the point A of the AC surface and the midpoint O of the AB surface are selected as the design calculation of the electrical position memory uniformity, then the right angle of the triangle Edge is hypotenuse is 2;

[0059] Point A on the AC plane:

[0060] Determine the irradiation area of ​​each target source. Under the condition of target source 1 single target, the critical situation is that the AC side and the point of target source 1 are in a straight line, and the irradiation area of ​​target source 1 single target is calculated as (- 15°, 105°);

[0061] Further, the irradiation areas of target source 2, target source 3 and target source 4 are respectively: target source 2 (75 points, 195 points), target source 3 (165 points, 285 points), target source 4 (255 points, 155);

[0062] Overlapping regions for each target source:

[00...

Embodiment 2

[0079] In the large-scale rectangular mold base ABCD type, A, B, C and D are used as the four vertices of the rectangle, and the length of the rectangle is wide as Select point A on the AD surface and point B on the AB surface as typical positions for uniformity calculation:

[0080] AD point A:

[0081] After determining the irradiation area of ​​the target source, target source 1 (-60,, 600), target source 2 (300, 150,), target source 3 (120,, 240,), target source 4 (210,, 330, );

[0082] Overlapping regions for each target source:

[0083] Target source 1, 4 (-30 domain, 03);

[0084] Target source 1, 2 (300, 600);

[0085] Target source 2, 3 (120 domains, 150 domains);

[0086] Target source 3, 4 (domain 210, domain 240);

[0087] Point B on face AB:

[0088] Irradiation area of ​​each target: target source 1 (30°, 150°), target source 2 (300°, 150°), target source 3 (120°, 240°), target source 4 (210°, 330°) ;

[0089] Overlap area:

[0090] Target 1, 4 (30°...

Embodiment 3

[0098] In the ABO type of large-scale arc-shaped mold base, A arc-shaped outer ring is located at the endpoint of the X-axis, B is the midpoint of the arc-shaped inner ring, and O is the center of the arc, so the radius of the outer arc is 1, and the radius of the inner arc is Select point A on the outer arc surface and point B on the inner arc surface as typical positions for uniformity calculation:

[0099] Point A on the outer arc surface:

[0100] The irradiation area of ​​each target source: target source 1 (30:, 150 is), target source 2 (300, 150 is), target source 3 (120 is, 240 is), target source 4 (210 is, 330 is );

[0101] Overlapping regions for each target source:

[0102] Target source 1, 4 (area 30, area 60);

[0103] Target source 1, 2 (120 domains, 150 domains);

[0104] Target source 2, 3 (domain 210, domain 240);

[0105] Target source 3, 4 (300 domain, 330 domain);

[0106] Point B on the inner arc surface:

[0107] Irradiation area of ​​each target...

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Abstract

The invention discloses a method for improving large mold PVD film uniformity. The rotating speed of a rotating shaft of a mold tray is adjusted and controlled, whole coating uniformity of the mold PVD film can be achieved, any auxiliary device does not need to be mounted in a vacuum cavity, disturbance and influences of magnetic field distribution, deposition efficiency and other key factors deciding quality in the PVD coating process can be avoided, and the method can be efficiently applied to various PVD devices.

Description

technical field [0001] The invention relates to the field of coating and large-scale mold preparation, in particular to a method for improving the uniformity of PVD film layers of large-scale molds. Background technique [0002] PVD coating has the advantages of strong controllability and good stability, which can greatly increase the surface hardness of the mold, reduce surface wear, improve the high temperature resistance and corrosion resistance of the mold, greatly improve the life of the mold, and reduce the working cost. In the coating process of large molds, the area of ​​the mold itself is too large relative to the target material, which exacerbates the problem of inhomogeneity of the film layer during the coating process, and seriously affects the quality of the film layer of large molds. [0003] In order to adjust the film layer distribution during the coating process, it is a commonly used technology in the industry to set a correction plate between the cathode t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/50C23C14/54C23C14/35
CPCC23C14/35C23C14/505C23C14/54
Inventor 夏原李光高方圆李明南
Owner INST OF MECHANICS - CHINESE ACAD OF SCI
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