Cleansing milk for pox-skin care and preparation method of milk

A facial cleanser and raw material technology, applied in the field of facial cleanser, can solve problems such as inability to deeply clean dirt and oil, easy roughness of facial skin, and large skin irritation, and achieve strong penetration, reduce acne regeneration, and improve acne skin effect

Inactive Publication Date: 2019-04-19
秋臣化妆品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The anti-acne ingredients contained in facial cleanser in the prior art are basically antibiotics, hormones, etc., such as clindamycin, retinoic acid, metronidazole, etc., long-term use has large side effects, greater skin irritation, and facial skin tends to become rough , and does not deep clean dirt and grease

Method used

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  • Cleansing milk for pox-skin care and preparation method of milk

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] A cleanser for acne skin care, which is made of the following raw materials in parts by mass:

[0063] Aloe vera 22g, honeysuckle flower 18g, purslane 16g, glycerin 8g, propylene glycol 2g, myristic acid 4g, stearic acid 1g, sodium lauroyl glutamate 2g, potassium hydroxide 3g, palmitic acid 2g, cetearyl Alcohol-25 is 1g, ethylene glycol distearate 2g, lauric acid 1g, methylparaben 3g, propylparaben 4g, deionized water 20g, amino acid surfactant 15g, thickener 10g, Inorganic salt 6g.

[0064] Wherein, the amino acid surfactant comprises the following raw material components: 6 g of cocamide DEA, 5 g of potassium cocoyl glycinate and 4 g of sodium cocoyl glycinate.

[0065] The thickener includes the following raw material components: 4g of polyvinylpyrrolidone and 6g of acrylate copolymer.

[0066] The inorganic salt includes the following raw material components: 4g of sodium chloride and 2g of potassium chloride.

[0067] The preparation of this acne skin care clean...

Embodiment 2

[0077] A cleanser for acne skin care, which is made of the following raw materials in parts by mass:

[0078] Aloe vera 23g, honeysuckle flower 20g, purslane 18g, glycerin 9g, propylene glycol 4g, myristic acid 5g, stearic acid 2g, sodium lauroyl glutamate 4g, potassium hydroxide 5g, palmitic acid 3g, cetearyl Alcohol-25: 2g, ethylene glycol distearate 3g, lauric acid 3g, methylparaben 4g, propylparaben 5g, deionized water 25g, amino acid surfactant 20g, thickener 12g, Inorganic salt 8g.

[0079] Wherein, the amino acid surfactant comprises the following raw material components: Cocamide DEA 7g, Potassium Cocoyl Glycinate 7g and Sodium Cocoyl Glycinate 6g.

[0080] The thickener includes the following raw material components: 5g of polyvinylpyrrolidone and 7g of acrylate copolymer.

[0081] The inorganic salt includes the following raw material components: 5g of sodium chloride and 3g of potassium chloride.

[0082] The preparation of this acne skin care cleanser comprises ...

Embodiment 3

[0092] A cleanser for acne skin care, which is made of the following raw materials in parts by mass:

[0093] Aloe vera 26g, honeysuckle flower 22g, purslane 20g, glycerin 10g, propylene glycol 6g, myristic acid 6g, stearic acid 3g, sodium lauroyl glutamate 6g, potassium hydroxide 7g, palmitic acid 4g, cetearyl Alcohol-25: 3g, ethylene glycol distearate 4g, lauric acid 5g, methylparaben 5g, propylparaben 6g, deionized water 30g, amino acid surfactant 25g, thickener 14g, Inorganic salt 10g.

[0094] Wherein, the amino acid surfactant comprises the following raw material components: Cocamide DEA 8g, Potassium Cocoyl Glycinate 9g and Sodium Cocoyl Glycinate 8g.

[0095] The thickener includes the following raw material components: 6g of polyvinylpyrrolidone and 8g of acrylate copolymer.

[0096] The inorganic salt includes the following raw material components: 6g of sodium chloride and 4g of potassium chloride.

[0097] The preparation of this acne skin care cleanser comprise...

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Abstract

The invention discloses cleansing milk for pox-skin care and a preparation method of the milk. The cleansing milk for pox-skin care is prepared from, by mass, 22-26 parts of aloe, 18-22 parts of honeysuckle flowers, 16-20 parts of herba portulacae, 8-10 parts of glycerinum, 2-6 parts of propylene glycol, 4-6 parts of myristic acid, 1-3 parts of stearic acid, 2-6 parts of sodium lauroyl glutamate,3-7 parts of potassium hydroxide, 2-4 parts of palmatic acid, 1-3 parts of ceteareth-25, 2-4 parts of glycol distearate, 1-5 parts of lauric acid, 3-5 parts of methylparaben, 4-6 parts of propyl hydroxybenzoate, 20-30 parts of deionized water, 15-25 parts of an amino acid surfactant, 10-14 parts of a thickener and 6-10 parts of inorganic salt. The cleansing milk has the advantages that redundant fat of the skin can be washed out, the face dirt and fat are effectively and deeply removed, and the cleansing milk has the functions of pore blocking prevention, pox prevention, nourishing and herbalcare.

Description

technical field [0001] The invention relates to the field of facial cleanser, in particular to a facial cleanser for acne skin care and a preparation method thereof. Background technique [0002] Facial cleanser, also called facial cleanser, is a cleaning product used to clean facial dirt such as sweat, dust, and make-up. Ordinary facial cleansers have a single function, only have a single cleansing effect, or simply have a certain whitening effect, but other effects are poor, and the moisturizing and anti-acne properties are not ideal. In modern society, acne is a common skin disease. Modern medicine believes that acne is an inertial inflammatory lesion of hair follicles and sebaceous glands. It is more common in areas with strong cortical secretion such as the face, chest and back. Also often referred to as "acne", patients are prone to self-esteem, impaired self-confidence, embarrassment, depression, tension and other social and psychological problems, which will cause...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/44A61K8/37A61K8/36A61K8/20A61K8/34A61P17/10A61Q19/00A61Q19/10
CPCA61K8/20A61K8/345A61K8/361A61K8/37A61K8/44A61K2800/72A61Q19/008A61Q19/10A61K8/9789A61K8/9794A61P17/10
Inventor 张寒秋
Owner 秋臣化妆品有限公司
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