Deposition device and atomic layer deposition equipment

Abstract

The invention provides a deposition device. In the deposition device, a hollow shell is used as a reaction cavity. The deposition device comprises a supply unit communicating with the reaction cavity,wherein the supply unit comprises a reactant conveying module which is detachably connected to a reaction unit. Atomic layer deposition equipment comprises a rack and the deposition device and can beused for preparing powder surface coating layers. The atomic layer deposition equipment can effectively solve the problems of cross contamination and incomplete ALD (atomic layer deposition) particlecoating layers occurring when different thin film materials are deposited.

Description

technical field [0001] The invention relates to the field of thin film deposition, in particular to a deposition device and atomic layer deposition equipment. Background technique [0002] Particle surface functionalization is an important part of material surface engineering technology, and it is of great significance to improve the original performance of particles. For example, nano-silver particles have good thermal conductivity, electrical conductivity, and surface plasmon resonance effect. Wrapping nano-silver particles in carbon nanotubes (CNTs@Ag) can enhance the photoelectric performance of matrix carbon nanotubes; in the catalyst The surface of the particles is coated with a protective layer, which can effectively prevent the metal catalysts from agglomerating during the sintering process, resulting in a decrease in catalytic performance or even loss of catalytic performance. [0003] Common methods for particle surface functionalization include sol-gel method (So...

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