Transparent electrode pattern repairing method and touch display panel

Abstract

The invention relates to the technical field of display, and discloses a transparent electrode pattern restoration method and a touch display panel, and the preparation method comprises the steps: detecting whether a formed transparent electrode pattern has defects or not; forming a photoresist layer on the transparent electrode pattern with the defect; patterning the photoresist layer to form a photoresist pattern complementary to the ideal transparent electrode pattern, and exposing the transparent electrode pattern with defects; forming a repair layer on the photoresist pattern and the transparent electrode pattern with the defect; and removing the part of the repair layer on the photoresist pattern while stripping the photoresist pattern, so that the reserved part of the repair layer and the transparent electrode pattern with the defect form an ideal transparent electrode pattern. According to the preparation method of the transparent electrode layer, the repair layer is prepared on the transparent electrode pattern with the incomplete pattern to form the ideal transparent electrode pattern, so that the repair of the incomplete transparent electrode pattern is realized, and theyield of a terminal product and the performance of a screen are improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for repairing a transparent electrode pattern and a touch display panel. Background technique [0002] In the thin film field effect transistor liquid crystal display industry, the rotation of liquid crystal molecules is mainly controlled by the electric field generated between the pixel electrode and the common electrode to achieve the effect of the desired display screen. Whether the potential of the pixel electrode can reach the required value is closely related to whether there is a delay in the data signal. [0003] SLOC products with touch function are attracting more and more attention and become the trend of future development. The traditional SLOC process is: glass cell, ITO deposition, exposure, etching, OC layer deposition. Stains such as particles existing before the deposition of the ITO film and particles under the photoresist film layer cause the photor...

AI Technical Summary

Problems solved by technology

Stains such as particles existing before the deposition of the ITO film and particles under the photoresist film layer cause the photoresist in the stained area to break easily, and the infiltration of the chemical solution during ITO wet etching can easily lead to additional ITO disconnection, thereby Affect the touch function and yield of the product

[0004] Therefore, the ITO structure prepared in the prior art is easy to produce touch electrode breakpoints, which directly affects the yield and touch performance of end products, and because the touch electrodes are basically located in the light-transmitting area of ​​the panel, that is, the effective display area, it cannot Direct repair by conventional repair process, thus causing great yield loss

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