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A reference alignment pattern determination method and apparatus for visual alignment

A technology for aligning patterns and visual alignment, which is applied in image analysis, image data processing, and photoplate-making process on patterned surfaces, etc., and can solve problems such as limited application scenarios

Active Publication Date: 2019-05-28
INTEL PROD CHENGDU CO LTD +1
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However, the application scenarios of this method are limited

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  • A reference alignment pattern determination method and apparatus for visual alignment
  • A reference alignment pattern determination method and apparatus for visual alignment
  • A reference alignment pattern determination method and apparatus for visual alignment

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Embodiment Construction

[0067]With the continuous improvement of camera resolution or other hardware performance, as well as the continuous improvement of people's image processing algorithms, it can continuously meet the new requirements put forward by the industry for visual alignment systems. In the past, people improved the visual alignment system either by using high-resolution cameras or other high-performance hardware in hardware, or by improving image processing algorithms. However, simply improving the alignment method from the hardware will greatly increase the cost of the machine vision alignment system. At the same time, for some equipment, such as chip packaging in the semiconductor industry, the alignment accuracy must reach about 1 micron or less, and the resolution of existing cameras can no longer meet the requirements. However, improving the alignment method only from the software will increase the complexity of the algorithm, and an overly complex algorithm will affect the effectiv...

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Abstract

The present invention relates to a reference alignment pattern determination method and apparatus for visual alignment. The method comprises receiving a first alignment pattern having a first patternuniqueness and a first pattern size; calculating a first visual alignment time using the first alignment pattern; adjusting the first alignment pattern to a second alignment pattern having a second pattern uniqueness and a second pattern size, wherein the second pattern uniqueness is different from the first pattern uniqueness and / or the second pattern size is different from the first pattern size; calculating a second visual alignment time using the second alignment pattern; comparing the first visual alignment time with the second visual alignment time; and determining the first alignment pattern as the reference alignment pattern if the first visual alignment time is less than the second visual alignment time; otherwise, determining the second alignment pattern as the reference alignment pattern.

Description

technical field [0001] The present invention relates to the field of alignment of semiconductor units, in particular to a method and device for determining a reference alignment pattern used in vision alignment. Background technique [0002] Alignment operations are heavily used in electronics manufacturing equipment. Precision alignment is mainly used for the alignment of the mask plate and the wafer in the lithography process, the alignment of the chip and the substrate during chip bonding, and the alignment of components and the PCB substrate in the surface assembly process. Additionally, in the semiconductor industry, vision alignment is an essential process for perfect alignment of test probes with cells. Every day thousands of units in different processes need to be visually aligned. This has a huge impact on the operating efficiency of the plant. [0003] For visual alignment, it is usually necessary to select a relatively unique area on the unit as a reference pat...

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Application Information

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IPC IPC(8): G06T7/73G03F9/00
Inventor 陈蕴璐张廷梁
Owner INTEL PROD CHENGDU CO LTD
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