Holographic exposure system and method for fabricating grating
An exposure system and holographic technology, applied in the field of holographic exposure systems, can solve the problems of exposure system size expansion, system difficulty in installation or stability, decline, etc.
Active Publication Date: 2020-08-11
TSINGHUA UNIV
View PDF4 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0003] However, when preparing a large-period grating, the size of the exposure system for preparing the grating needs to be enlarged, resulting in difficulty in installation or a decrease in the stability of the system. Therefore, a new exposure system is needed to solve this problem and make the holographic exposure optical path suitable for the preparation of a large-period grating
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0023] Various exemplary embodiments, features, and aspects of the present disclosure will be described in detail below with reference to the accompanying drawings. The same reference numbers in the figures indicate functionally identical or similar elements. While various aspects of the embodiments are shown in drawings, the drawings are not necessarily drawn to scale unless specifically indicated.
[0024] The word "exemplary" is used exclusively herein to mean "serving as an example, embodiment, or illustration." Any embodiment described herein as "exemplary" is not necessarily to be construed as superior or better than other embodiments.
[0025] In addition, in order to better illustrate the present disclosure, numerous specific details are given in the following specific implementation manners. It will be understood by those skilled in the art that the present disclosure may be practiced without some of the specific details. In some instances, methods, means, componen...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The present disclosure relates to a holographic exposure system and method for making a grating. The system includes a first wave plate and a second wave plate that change a polarization direction ofa beam. A polarization beam splitter that splits the beam of a light source into a first beam and a second beam, and the two beams are respectively transmitted to a first pinhole filter and a reflector. The second beam is aligned with the polarization direction of the first beam by using the second wave plate. The reflector reflects the second beam to the second pinhole filter. The first pinhole filter and the second pinhole filter respectively filter and expand the first beam and the second beam, and then simultaneously transmit the first beam and the second beam to one side of a collimationmirror. The collimation mirror is located at a convergence portion of central optical axes of the two pinhole filters, collimates the first beam and the second beam and sends them to the other side toform an interference region, so that a grating pattern is formed on a surface of a substrate. A substrate bracket is configured to install the substrate and adjust a position of the substrate. A highquality large period grating can be prepared according to the system of embodiments of the present disclosure.
Description
technical field [0001] The present disclosure relates to the technical field of optical devices, in particular to a holographic exposure system and method for fabricating gratings. Background technique [0002] Diffraction grating is a typical diffractive optical element, which is widely used in spectral analysis, precision measurement, integrated optics, information optics, laser pulse compression and other fields. The period of the grating is generally in the range of hundreds of nanometers to tens of microns, and the grating with a period of several microns to tens of microns belongs to the large period grating, which is mainly used in precision measurement (such as grating ruler) and spectral imaging systems. [0003] However, when preparing a large-period grating, the size of the exposure system for preparing the grating needs to be enlarged, resulting in difficulty in installation or a decrease in the stability of the system. Therefore, a new exposure system is needed ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18
CPCG02B5/1857
Inventor 吴冠豪黎武南曾理江
Owner TSINGHUA UNIV