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Hot-wall hot wire CVD device for preparing large-area diamond film

A diamond film, large-area technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problems of uneven temperature distribution, inability to prepare large areas, etc., and achieve the effect of uniform growth in large areas

Pending Publication Date: 2019-08-02
杭州睿清环保科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the problem that the large-area diamond film cannot be prepared because the temperature is unevenly distributed in the large area around the hot wire and the substrate when the hot wire CVD method is used to prepare the diamond film. A hot-wall hot-wire CVD device for preparing large-area diamond films

Method used

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  • Hot-wall hot wire CVD device for preparing large-area diamond film
  • Hot-wall hot wire CVD device for preparing large-area diamond film
  • Hot-wall hot wire CVD device for preparing large-area diamond film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] The device structure of hot-wall hot-wire CVD for preparing large-area diamond films is as follows: figure 1 As shown, it includes a closed reaction chamber 1, an insulating wall 2, a front cover of the reaction chamber sealing flange 3, a rear cover of the reaction chamber sealing flange 4, a hot wire holder 5, a sample holder 6, a reaction gas cylinder 13, and a power supply 12. Vacuum pump 11, cooling circulating water machine 14, heating wire 10, heat insulation front baffle 9, heat insulation rear baffle 7 and resistance wire 8. The reaction chamber 1 is a quartz tube, and its front and rear ends are respectively connected with the reaction chamber sealing flange front cover 3 and the reaction chamber sealing flange rear cover 4, and placed in the heat insulating wall 2 constructed of porous alumina. A resistance wire 8 for heating is provided at the interface between the reaction chamber and the insulating wall. Both the reaction chamber sealing flange front cove...

Embodiment 2

[0034] The device structure of hot-wall hot-wire CVD for preparing large-area diamond films is as follows: figure 1As shown, it includes a closed reaction chamber 1, an insulating wall 2, a front cover of the reaction chamber sealing flange 3, a rear cover of the reaction chamber sealing flange 4, a hot wire holder 5, a sample holder 6, a reaction gas cylinder 13, and a power supply 12. Vacuum pump 11, cooling circulating water machine 14, heating wire 10, heat insulation front baffle 9, heat insulation rear baffle 7 and resistance wire 8. The reaction chamber 1 is a quartz tube, and its front and rear ends are respectively connected with the reaction chamber sealing flange front cover 3 and the reaction chamber sealing flange rear cover 4, and placed on the heat insulating wall 2 constructed of alumina fiber heat insulating material. Inside. A resistance wire 8 is provided between the reaction chamber and the insulating wall. Both the reaction chamber sealing flange front c...

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Abstract

The invention relates to a hot-wall hot wire CVD device for preparing a large-area diamond film. The device comprises a closed reaction chamber (1), heat insulation walls (2), a reaction chamber sealing flange front cover (3), a reaction chamber sealing flange rear cover (4), hot wire supports (5), sample supports (6), reaction gas bottles (13), a power supply (12), a vacuum pump (11), a cooling circulating water machine (14), hot wires (10), heat insulation front-arranged baffles (9), heat insulation rear-arranged baffles (7) and resistance wires (8). Due to the fact that the heat insulationwalls (2) and the reaction chamber (1) are directly provided with the resistance wires (8) used for heating treatment, so that the temperature of the whole chamber can be uniformly maintained to be700DEG C or above. Compared with the prior art, the device has the advantages that the production of the large-area diamond film can be realized, and the quality of the large-area diamond film is improved.

Description

technical field [0001] The invention belongs to the technical field of diamond film preparation, in particular to the preparation of a large-area diamond film anode, and relates to a hot-wall hot-wire CVD device for preparing a large-area diamond film. Background technique [0002] Diamond thin films are in great demand in the fields of automobiles, optical devices, aerospace and environmental protection, especially in the use of electrochemical treatment of industrial wastewater, the need for diamond thin film anodes is becoming more and more prominent. The preparation of large-area diamond films plays a decisive role in the development of these related industrial fields. [0003] In terms of industrial wastewater treatment, especially in the fields of fine chemical wastewater, pharmaceutical wastewater, and coal coking wastewater, traditional biochemical processes have been unable to effectively degrade this type of wastewater. This is because these wastewaters are wastew...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27C23C16/448
CPCC23C16/271C23C16/448
Inventor 不公告发明人
Owner 杭州睿清环保科技有限公司