A heater support device

A technology of support device and heater, applied in furnace heating element, metal material coating process, coating and other directions, can solve the problems of heat absorption and heat dissipation time, etc.

Active Publication Date: 2022-05-03
HUNG CHENG INT TECHNICAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] An object of the present invention is to provide a heater support device, which can solve the problem of long heat absorption and heat dissipation time required for multiple support members in the prior art to be heated and then cooled to remove the substrate, and can effectively shorten the entire heating process. operating hours to increase productivity

Method used

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Examples

Experimental program
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Embodiment Construction

[0036] see Figure 1~3 As shown, the heater supporting device 1 of the present invention is installed on the inner periphery of a surrounding heat insulator 11 in a vertical furnace for supporting a coil-type heating element 12 coaxial with the surrounding heat insulator 11 . The above-mentioned vertical furnace can be used for a plurality of semiconductor manufacturing processes such as diffusion and chemical vapor deposition (CVD), and the vertical furnace can heat the reaction gas inside the furnace through the above-mentioned process to make multiple semiconductors such as wafers A thin film is formed on the surface of the substrate. The surrounding heat insulator 11 is in the shape of a circular tube, and its inner periphery is provided with a plurality of axial and spaced elongated axial grooves. The peripheral edge is radially depressed, and the cross-section of the groove is a tapered trapezoid, and its opening position has a limiting portion 131 whose width is smalle...

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PUM

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Abstract

A heater support device is installed on the inner periphery of a surrounding heat insulator in a vertical furnace, and the inner periphery of the surrounding heat insulator is provided with a plurality of axial and spaced engaging parts; and the heater support device includes multiple A limiter and multiple supports. Wherein, a plurality of limiting parts are loosely clamped on a plurality of corresponding engaging parts, so that a plurality of limiting parts and a plurality of engaging parts will not be disengaged; a corresponding limiting part and an engaging part There is a radial space between them, so that the stopper has a sufficient radial movement distance in the engaging part; and a plurality of support members are respectively located at one end of the plurality of stoppers, and each of the plurality of support members has a positioning groove for A coil-type heating element is received and supported coaxially with the surrounding insulation.

Description

technical field [0001] The present invention relates to a heater support device, and more particularly to a heater support device that prevents a plurality of support members from detaching from surrounding heat insulators during thermal expansion / contraction, and is used in a vertical furnace on semiconductor manufacturing equipment. Background technique [0002] In the diffusion process and chemical vapor deposition (CVD) process of the semiconductor process, the vertical furnace mainly uses the coil type heating element in the furnace to heat the reaction gas, and forms a thin film on multiple substrates such as wafers. Wherein, the coil-type heating assembly is supported by a plurality of axially arranged support members, and the plurality of support members are supported and positioned by the member support, and the heat insulator surrounds the member support. In the thermal expansion / contraction process of the above-mentioned structure during the thin film formation of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05B3/66C23C16/46
CPCH05B3/66C23C16/46
Inventor 大野昌孝林士杰
Owner HUNG CHENG INT TECHNICAL CO LTD
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