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Brushing device

A technology for cleaning brushes and substrates, used in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as insufficient, and achieve the effect of improving cleaning effect, improving cleaning efficiency, and ensuring stability and reliability.

Active Publication Date: 2019-08-06
K C TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] Therefore, recently, various studies have been carried out to effectively control the cleaning conditions of the cleaning brush on the substrate, improve the cleaning efficiency of the substrate, and improve the cleaning effect, but it is far from enough and needs to be developed.

Method used

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Embodiment Construction

[0034] The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings, but the present invention is not limited or limited by the embodiments. For reference, in this description, the same symbols refer to substantially the same elements. Under this rule, the content recorded in different drawings can be quoted for explanation, and the content judged to be self-evident or repeated by practitioners is then Can be omitted.

[0035] refer to Figure 3 to Figure 8 , the scrubbing device 10 of the present invention includes: a cleaning brush 100, which rotates in contact with the surface of the substrate W; a torque sensing part 200, which senses the rotational torque of the cleaning brush 100; When the rotational torque exceeds a preset range, the rotational speed of the cleaning brush 100 fluctuates.

[0036] Whether or not the pressing force that induces damage to the substrate W occurs can be inferred from the r...

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Abstract

The present invention relates to a brushing apparatus, comprising a cleaning brush rotationally contacting a surface of a substrate; a torque sensing unit for sensing the rotational torque of the cleaning brush; and a speed control unit which varies the rotational speed of the cleaning brush when the rotational torque of the cleaning brush sensed by the torque sensing unit exceeds a preset settingrange, thereby obtaining beneficial effects of improving the cleaning efficiency of the substrate and improving the cleaning effect.

Description

technical field [0001] The present invention relates to a scrubbing device, more specifically, to a scrubbing device capable of improving the cleaning efficiency and cleaning effect of a substrate. Background technique [0002] After processing substrates used in display devices or wafers used in manufacturing semiconductor elements (hereinafter, they are collectively referred to as "substrates"), a cleaning process is performed to remove foreign matter adhering to the surface during the processing process. [0003] figure 1 and figure 2 The conventional brush cleaning device 9 is shown in figure. If the conventional scrubbing device 9 transfers the substrate W between the pair of cleaning brushes 10, 10' by means of the substrate transfer unit, one of the pair of cleaning brushes 10, 10' moves up and down 10d, and the cleaning brushes 10, 10 'Clean the surface of the substrate W by rotating it with the substrate W sandwiched between them. [0004] The substrate W is ro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B1/00B08B1/02B08B3/02H01L21/67B08B1/20
CPCB08B3/022H01L21/67046B08B1/20B08B1/12H01L21/67706B08B1/32
Inventor 赵珳技
Owner K C TECH