A method and device for manufacturing a high aspect ratio micro-nano structure

Abstract

The invention discloses a method and device for manufacturing a micro-nano structure with a high aspect ratio, which belongs to the field of flexible electronic manufacturing. The method specifically includes: applying an electric field to the printed micro-nano droplet pattern on the substrate, inducing the edge of the micro-nano droplet pattern to shrink laterally and stretch longitudinally to form a micro-nano structure with a high aspect ratio. The device includes an upper electrode plate, a lower electrode plate and an external high-voltage amplifier system. The wire connection ends of the upper electrode plate and the lower electrode plate are respectively connected to the external high-voltage amplifier system. The substrate that has been printed with micro-nano droplet patterns is placed on the lower On the electrode plate, an external high-voltage amplifier system is activated to form an electric field between the upper and lower electrode plates, which induces the lateral shrinkage of the micro-nano droplet pattern edge and longitudinal stretching to form a high aspect ratio micro-nano structure. The invention generates micro-nano patterns with high aspect ratios through electric field induction, significantly improves the manufacturing efficiency of the micro-nano structures, and meets precision requirements.

Description

technical field [0001] The invention relates to the field of flexible electronics manufacturing, in particular to a method and device for manufacturing a micro-nano structure with a high aspect ratio. Background technique [0002] With the development of science and technology, the demand for refined equipment is getting stronger and stronger. Flexible electronic technology has broad application prospects in micro-nano processing, especially in the fields of sensors, flexible displays, and smart skin. Nowadays, in the surface treatment of nanoimprinting, photolithography, inkjet printing and other technologies, micro-nano structures with high aspect ratios have high application value, but for this kind of micro-nano structures that are not easy to manufacture, how to quickly and effectively The manufacture of it becomes a difficult problem that needs to be solved. [0003] At present, hydrophobic coatings on the substrate surface and nano-patterns on the substrate surface a...

AI Technical Summary

Problems solved by technology

Nowadays, in the surface treatment of nanoimprinting, photolithography, inkjet printing and other technologies, micro-nano structures with high aspect ratios have high application value, but for this kind of micro-nano structures that are not easy to manufacture, how to quickly and effectively The manufacture of the

[0003] At present, the hydrophobic coating on the surface of the substrate and the nano-pattern on the surface of the substrate are mostly used to realize the high-thickness-width-ratio micro-nano structure. Due to different ink material systems, there are different material coatings and micro-nano pattern processing, the process is cumbersome, and the thickness-width ratio is difficult to control.

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