A kind of rotating structure and preparation method thereof

A technology of rotating structure and rotating unit, which is applied in the field of micro-electromechanical systems, can solve problems such as the difficulty of electrostatically driven rotating structures, and achieve the effect of small degree of freedom and simple preparation process

Active Publication Date: 2020-04-24
SIWAVE INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] Based on this, it is difficult to obtain an electrostatically driven rotating structure with stable performance and no need for high driving voltage in the prior art.

Method used

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  • A kind of rotating structure and preparation method thereof
  • A kind of rotating structure and preparation method thereof
  • A kind of rotating structure and preparation method thereof

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Embodiment Construction

[0065] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be fully described below through specific implementation in combination with the drawings in the embodiments of the present invention. Apparently, the described embodiments are some embodiments of the present invention, rather than all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts, All fall within the protection scope of the present invention.

[0066] figure 1 It is a schematic flowchart of a method for preparing a rotating structure provided by an embodiment of the present invention. The method for preparing a rotating structure provided by an embodiment of the present invention is used to prepare an electrostatically driven rotating structure, and the rotating structure includes a ramp unit and a rot...

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Abstract

The embodiment of the invention discloses a rotating structure and a preparation method thereof, the preparation method of the rotating structure comprises the following steps: preparing a slope unitby adopting an ion beam etching process, and the slope unit comprises a first slope surface and a second slope surface which are independently arranged; preparing first electrodes on the first slope surface and the second slope surface respectively; preparing a rotatable unit on one side of the slope unit; and preparing a second electrode, wherein the second electrode is electrically connected with the rotatable unit, and the rotatable unit is used for rotating according to electrostatic force between the first electrode and the second electrode. By the adoption of the technical scheme, the slope unit is prepared through the ion beam etching technology, the slope unit is easy to prepare, and the technical problem that in the prior art, the technology for preparing the slope unit through the multiple photoetching technologies is complex is solved; meanwhile, when the ion beam etching process is adopted for preparing the slope unit, the inclination angle of the slope unit can be very small, and the preparation flexibility of the slope unit is improved.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of micro-electro-mechanical systems, and in particular to a rotating structure and a manufacturing method thereof. Background technique [0002] In the field of microelectromechanical systems, rotating structures can be applied to wavefront correction of adaptive optics, spatial light modulation, alignment of optical elements, micromanipulators, optical switches, optical attenuators, and optical multiplexers. [0003] According to the different driving methods of the rotating structure, it is mainly divided into: electromagnetic drive, electrothermal drive, piezoelectric drive and electrostatic drive. Electromagnetic driving uses the magnetic force generated by electromagnets or permanent magnets as the driving force. The driving current of this driving method is large, the energy consumption is large, and the manufacture of magnetic films and the application of external magnetic fields...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81B7/02B81C1/00
CPCB81B7/02B81C1/00134
Inventor 焦继伟刘京费跃陈思奇
Owner SIWAVE INC
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