A kind of manufacturing method of full-color oled display
A manufacturing method and display technology, which are applied in the manufacturing of semiconductor/solid-state devices, semiconductor devices, electric solid-state devices, etc., can solve the problem of mismatching of the pattern of the color filter layer and the OLED functional layer, and achieve the effect of ensuring the display quality.
Active Publication Date: 2021-04-30
TRULY SEMICON
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Problems solved by technology
[0003] The technical problem to be solved by the present invention is to provide a manufacturing method of a full-color OLED display, which can effectively solve the problem of color filter layer and OLED functional layer due to the deviation of the TP value of the mask plate of the color filter layer and the mask plate of the OLED functional layer. Problems with pattern mismatch
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[0020] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings. Apparently, the described embodiments are some, not all, embodiments of the present invention. Based on the described embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0021] Such as figure 1 Shown, it has shown a kind of manufacturing method of full-color OLED display provided by the present invention, and this manufacturing method comprises the following steps:
[0022] Fabricate a color filter layer and a flat layer sequentially on a transparent substrate to form a color filter substrate;
[0023] forming a water and oxygen barrier layer on the color filter substrate;
[0024] formi...
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The invention provides a method for manufacturing a full-color OLED display, comprising the following steps: sequentially manufacturing a color filter layer and a flat layer on a transparent substrate to form a color filter substrate; forming a water-oxygen barrier layer on the color filter substrate; An OLED functional layer is formed on the water-oxygen barrier layer; wherein, the film thickness of the water-oxygen barrier layer is determined according to the TP value of the mask plate of the color filter layer and the mask plate TP value of the OLED functional layer. The manufacturing method provided by the present invention makes the film thickness of the water-oxygen barrier layer be determined according to the TP value of the mask plate of the color filter layer and the TP value of the mask plate of the OLED functional layer, and according to the TP value of the mask plate of the color filter layer and the mask plate of the OLED functional layer The TP value of the stencil to determine the film thickness of the water-oxygen barrier layer can better compensate for the mismatch between the color filter layer pattern and the OLED functional layer pattern caused by the mask error, so that the final formed color filter layer pattern and OLED functional layer pattern Matching effectively guarantees the display quality.
Description
technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a full-color OLED display. Background technique [0002] White light combined with color filter (CF+W) is an important method to achieve full-color display. In the manufacturing method of this kind of full-color OLED display, a color filter layer is generally arranged on a substrate first, and then an OLED functional layer is arranged on top of it. Among them, the color filter layer needs to match the OLED display layer, but since the color filter layer mask and the OLED functional layer mask are made separately, there are often certain errors, so that the TP value of the color filter layer mask and the OLED functional layer The TP value of the mask plate has a large deviation, which in turn leads to a large deviation in the TP value of the color filter layer pattern and the OLED functional layer pattern. The TP (total pitch) value is the side length ...
Claims
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IPC IPC(8): H01L51/56H01L51/52H01L27/32
CPCH10K59/32H10K59/38H10K50/84H10K50/844H10K50/86H10K71/00
Inventor 罗志猛赵云张为苍
Owner TRULY SEMICON