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Calibration method for mass flow meters of plate PECVD equipment

A mass flow meter and calibration method technology, applied in the field of mass flow meter calibration, can solve problems such as low precision, deviation between actual flow and set value, inability to accurately control the thickness of SiNx film, etc., to ensure the coating effect, and the operation is simple and convenient Effect

Active Publication Date: 2019-10-01
JA SOLAR +1
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Problems solved by technology

Ammonia flowmeters and silane flowmeters commonly used in plate PECVD equipment are both mass flowmeters, which have low precision and often have deviations between the actual flow rate and the set value, so that the thickness of the deposited SiNx film cannot be accurately controlled, which affects the coating effect

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  • Calibration method for mass flow meters of plate PECVD equipment
  • Calibration method for mass flow meters of plate PECVD equipment

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Embodiment Construction

[0026] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are only used to illustrate the present invention, but not to limit the scope of the present invention.

[0027] Such as figure 1 As shown, according to the calibration method of the mass flowmeter of the plate-type PECVD equipment of the embodiment of the present invention, the plate-type PECVD equipment includes mass flowmeters M1 to Mn, wherein, n is a natural number greater than 3, and the calibration method includes the following steps:

[0028] Step S1, releasing the gas in the reaction chamber to stabilize the pressure in the reaction chamber of the plate PECVD equipment to P0;

[0029] According to some embodiments of the present invention, step S1 specifically includes: depressurizing the reaction chamber of the plate-type PECVD equipment, so that the pressure in the reactio...

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Abstract

The invention relates to a calibration method for mass flow meters of plate PECVD equipment. The plate PECVD equipment includes mass flow meters M1 to Mn, wherein n is a natural number greater than 3.The calibration method includes the following steps: S1, releasing the gas in a reaction chamber to stabilize the pressure in the reaction chamber of the plate PECVD equipment to P0; S2, introducinggas of a predetermined amount of flow into the reaction chamber of the plate PECVD equipment via the mass flow meter M1, and recording the pressure in the reaction chamber as P1 after the pressure inthe reaction chamber is stabilized; S3, repeating S1 and S2, and recording the pressure in the reaction chamber as P2 to Pn after the gas of a predetermined amount of flow is introduced into the reaction chamber of the plate PECVD equipment via the mass flow meters M2 to Mn; and S4, determining mass flow meters needing to be replaced according to the measured P1 to Pn and replacing the mass flow meters. By using the calibration method of the embodiment of the invention, abnormal mass flow meters can be judged accurately and replaced, the coating effect is ensured, and the operation is simple and convenient.

Description

technical field [0001] The invention relates to the technical field of flowmeters, in particular to a method for calibrating mass flowmeters of plate-type PECVD equipment. Background technique [0002] In the production of solar cells, ammonia and silane are passed through several different vent tubes to deposit SiNx thin films on silicon wafers in a plate PECVD (plasma enhanced chemical vapor deposition) equipment, where each vent tube passes ammonia gas flow The meter and the silane flow meter are set separately, and SiNx thin films with different film thicknesses and refractive indices are deposited by setting different gas ratios. Ammonia flowmeters and silane flowmeters commonly used in plate PECVD equipment are both mass flowmeters, which have low precision and often have deviations between the actual flow rate and the set value, so that the thickness of the deposited SiNx film cannot be accurately controlled, which affects the coating effect . Contents of the inven...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/66H01L31/18
CPCH01L22/12H01L22/20H01L31/18Y02P70/50
Inventor 赵环张福庆孙晓凯
Owner JA SOLAR
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