Unlock instant, AI-driven research and patent intelligence for your innovation.

Method and system for polishing product surface

A product and light source technology, applied in the direction of optical testing of defects/defects, material analysis through optical means, instruments, etc., can solve the problem that the dust on the LCD screen cannot be completely detected, so as to reduce the cost of dust removal, improve the efficiency of dust removal, and avoid damage Effect

Active Publication Date: 2022-01-18
深圳市大族半导体装备科技有限公司
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Based on this, it is necessary to address the above technical problems and provide a method and system for lighting the product surface, which can solve the problem that the dust on the LCD screen cannot be completely detected in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and system for polishing product surface
  • Method and system for polishing product surface
  • Method and system for polishing product surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0049] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0050] It should be noted that when an element is referred to as being “fastened to” another element, it may be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0051] It is to be understood that the terms "length", "width", "top", "bottom", "front", "rear", "left", "right", "vertical", "horizontal", "top" , "bottom", "inner", "outer" and other indicated orientations or positio...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method and a system for polishing the surface of a product. The method includes: after receiving the positive light source dust detection signal, when the camera device receives the first reflected light, acquiring the first image information of the surface to be detected captured by the camera device; after receiving the side light source dust detection signal, after the camera device receives When the second reflected light comes, obtain the second image information of the surface to be detected captured by the imaging device; after performing image processing on the first image information and the second image information respectively, the first image information and the second image after the image processing The dust information is extracted from the dust information, and the dust size and dust position on the surface to be detected are confirmed according to the dust information. Through the lighting method of the product surface provided by the present invention, the position of the transparent and opaque dust on the surface of the transparent or opaque product to be tested can be precisely positioned, and the size of the dust can also be confirmed, thereby improving the dust removal efficiency.

Description

technical field [0001] The invention relates to the technical field of dust detection, in particular to a method and system for polishing the surface of a product. Background technique [0002] In the manufacturing process of display panel devices, other optical devices and precision devices, the cleanliness of the product surface is an important indicator for evaluating product quality. In particular, whether there is dust on the surface of the LCD screen can directly reflect the cleanliness of the LCD screen and the quality of the LCD screen. [0003] In the existing technology, when dust detection is performed on the product surface of the liquid crystal screen, it is mainly to detect the highly transparent dust on the transparent liquid crystal screen, but the opaque dust on the transparent liquid crystal screen cannot be detected at the same time, and, For the opaque LCD screens that currently occupy a large proportion, the opaque dust and highly transparent dust on th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/94G01N21/01
CPCG01N21/94G01N21/01G01N2021/945G01N2021/0112
Inventor 陈世隐关文武贾睿王舒颖吴垚王溪姚远峰张育生张纯济杨振华高云峰
Owner 深圳市大族半导体装备科技有限公司
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com