Ultra-high-vacuum ultra-low-temperature in-situ multi-probe transport measurement system

A technology of ultra-high vacuum and measurement system, which is applied in the direction of measurement device, scanning probe technology, scanning probe microscopy, etc., and can solve the problems that the in-situ transportation test of thin film device growth cannot be realized.

Pending Publication Date: 2019-11-26
YISHENG SCI INSTR (JIAXING) CO LTD
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, most of the existing technologies cannot realize the growth of thin film devices at high temperature and the in-situ transport test of thin film devices at low temperature, so ...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultra-high-vacuum ultra-low-temperature in-situ multi-probe transport measurement system
  • Ultra-high-vacuum ultra-low-temperature in-situ multi-probe transport measurement system
  • Ultra-high-vacuum ultra-low-temperature in-situ multi-probe transport measurement system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] The following description serves to disclose the present invention to enable those skilled in the art to carry out the present invention. The preferred embodiments described below are only examples, and those skilled in the art can devise other obvious variations. The basic principles of the present invention defined in the following description can be applied to other embodiments, variations, improvements, equivalents and other technical solutions without departing from the spirit and scope of the present invention.

[0026] see attached figure 1 , figure 1 It is a structural schematic diagram of the ultra-high vacuum ultra-low temperature in-situ multi-probe transport measurement system of the present invention, figure 2 It is a structural schematic diagram of the ultra-high vacuum ultra-low temperature in-situ multi-probe transport measurement system of the present invention, image 3 It is a structural schematic diagram of the ultra-high vacuum ultra-low tempera...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an ultra-high-vacuum ultra-low-temperature in-situ multi-probe transport measurement system, which comprises a rapid sample injection chamber, a growth chamber, a transport test chamber, a vacuum interconnection system, a system support and a power system, wherein the rapid sample injection chamber is mainly used for realizing rapid transfer of samples and probe tips between the atmosphere and an ultra-high vacuum environment; the growth chamber mainly realizes growth of specified-pattern thin film devices and electrodes at high temperature; the transport test chamber mainly realizes in-situ multi-probe transport measurement of the grown thin film devices at extremely-low temperature; and the vacuum interconnection system mainly realizes vacuum connection between the system and other systems. The ultra-high-vacuum ultra-low-temperature in-situ multi-probe transport measurement system can control the sample temperature from low temperature to room temperature through the vacuum environment and refrigeration technology.

Description

technical field [0001] The invention belongs to the technical field of thin film sample growth, and in particular relates to an in-situ multi-probe transport measurement system at ultra-high vacuum and extremely low temperature. Background technique [0002] The in-situ multi-probe transport measurement system is mainly used for the growth of thin film devices and electrodes and the in-situ electrical transport measurement of devices. The principle is to use a vacuum piezoelectric ceramic motor to control the movement of the mask plate in the growth chamber and cooperate with the evaporation source to grow samples and electrodes with a specified pattern, and use an independent probe in the transport measurement chamber to form contact with the electrode of the thin film device, through the external circuit Conduct electrical transport measurements. [0003] However, most of the existing technologies cannot realize the growth of thin film devices at high temperature and the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01Q60/00G01Q30/16G01Q30/10G01Q70/06
CPCG01Q30/10G01Q30/16G01Q60/00G01Q70/06
Inventor 王文杰
Owner YISHENG SCI INSTR (JIAXING) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap