Unlock instant, AI-driven research and patent intelligence for your innovation.

Vacuum evaporation device

An evaporation and vacuum technology, applied in the direction of vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problem that the distance between the evaporation source and the substrate cannot be adjusted, so as to reasonably control the thickness of the coating film and improve the quality of the coating film , to avoid the effect of too thick coating

Pending Publication Date: 2019-12-31
紫石能源有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The present invention aims to solve the technical problem that the existing vapor deposition device cannot adjust the distance between the vapor deposition source and the substrate in the vapor deposition chamber

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vacuum evaporation device
  • Vacuum evaporation device
  • Vacuum evaporation device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Such as Figure 1 ~ Figure 4 As shown, this embodiment provides a vacuum evaporation device, which is preferably applied to a PVD horizontal production line, and the vacuum evaporation device includes an evaporation chamber and a driving mechanism. A substrate 19 is arranged laterally in the evaporation chamber. The bottom plate 2 of the evaporation chamber is provided with a first through hole for the evaporation source 12 to pass through. The driving mechanism can drive the evaporation source 12 to pass through the first through hole and move up and down in the evaporation chamber to adjust the distance between the evaporation source 12 and the substrate 19 .

[0040] in particular:

[0041] see figure 2 , the driving mechanism includes a vertical guide rail 14 , a supporting plate 18 for carrying the evaporation source 12 , and a driving member for driving the supporting plate 18 to slide up and down along the vertical guiding rail 14 .

[0042] Further, the dri...

Embodiment 2

[0050] This embodiment also provides a vacuum evaporation device, which is basically the same as the vacuum evaporation device of Embodiment 1, and the similarities will not be repeated. The difference is (not shown in the figure): the upper end and the lower end of the vertical guide rail 14 are respectively The upper end bearing and the lower end bearing are connected, the upper end of the leading screw 15 is fixedly connected with the inner ring of the upper end bearing, and the lower end of the leading screw 15 is fixedly connected with the inner ring of the lower end bearing. The arrangement of the upper end bearing and the lower end bearing plays a role of limiting the operation of the lead screw 15, effectively improving the stability of the first lead screw 15 during operation.

Embodiment 3

[0052] This embodiment also provides a vacuum evaporation device applied to a PVD horizontal production line, which is basically the same as the vacuum evaporation device in Embodiment 1, and the similarities will not be repeated. The structure of the body has been further improved, that is, the evaporation chamber also includes a top plate and side plates, the bottom plate and the side plates are welded to each other to form a cavity with an upper end opening, and the top plate is detachably connected with the upper end opening of the cavity.

[0053] Further, the vapor deposition chamber also includes a top plate mounting block and a side plate mounting block, the top plate is detachably connected to the top plate mounting block, the side plate is detachably connected to the side plate mounting block, and the top plate mounting block can be connected to the side plate through fasteners. The board mounting blocks are connected so as to connect the top board to the upper openin...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the field of vacuum coating, in particular to a vacuum evaporation device. The vacuum evaporation device comprises an evaporation cavity and a driving mechanism; a first through hole allowing an evaporation source to pass is formed in a bottom plate of the evaporation cavity, and the driving mechanism can drive the evaporation source to penetrate through the first throughhole and move vertically in the evaporation cavity. According to the vacuum evaporation device, the longitudinal driving mechanism of the vacuum evaporation device can drive the evaporation source topenetrate through the first through hole and move vertically in the evaporation cavity, so that the purpose of adjusting the distance between the evaporation source and a substrate in the evaporationcavity is achieved, the coating thickness is reasonably controlled, and the coating efficiency and the coating quality are improved.

Description

technical field [0001] The invention relates to the field of vacuum coating, in particular to a vacuum evaporation device applied to a PVD horizontal production line. Background technique [0002] During the implementation process of PVD technology, a thin film is formed on the surface of related objects by applying a certain physical mechanism. For example, sputtering occurs by thermally evaporating a substance or by bombarding atoms on the surface of a substance. This effectively enables a controlled transfer of species from the raw material to the thin film. Summarized into three methods: vacuum evaporation coating, vacuum sputtering and vacuum ion coating. [0003] Evaporation refers to the process of evaporating and vaporizing the coating material (or film material) by using a certain heating and evaporation method under vacuum conditions, and the particles fly to the surface of the substrate to condense to form a film. However, because the performance and index of m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24
CPCC23C14/24
Inventor 苏艳波宋永明
Owner 紫石能源有限公司