Wavelength conversion device
A technology of wavelength conversion device and bellows, which is applied to laser parts, instruments, electrical components, etc., and can solve the problem of resolution reduction
Active Publication Date: 2020-02-14
AURORA ADVANCED LASER CO LTD
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- Abstract
- Description
- Claims
- Application Information
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Problems solved by technology
[0004] Since the spectral line width of KrF and ArF excimer laser devices in natural oscillation is as wide as about 350pm to 400pm, the laser light (ultraviolet light) projected on the wafer is reduced by the projection lens on the exposure device side, resulting in chromatic aberration and resulting in resolution. reduce
Method used
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no. 1 approach
[0037] 2.1 Structure
[0038] 2.2 Action
[0039] 2.3 Effect
no. 2 approach
[0041] 3.1 Structure
[0042] 3.2 Action
[0043] 3.3 Effect
no. 3 approach
[0045] 4.1 Structure
[0046] 4.2 Action
[0047] 4.3 Effect
[0048] 4.4 Variations
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Abstract
A wavelength conversion device is provided with: A. a crystal holder for holding a nonlinear crystal that wavelength-converts and emits an incident laser beam; B. a first container which accommodatesthe crystal holder and includes an incident window provided on the light path of the laser beam incident on the nonlinear crystal and an emitting window provided on the light path of the laser beam emitted from the nonlinear crystal; C. a second container accommodating the first container; D. a position adjustment mechanism for positional adjustment of the first container; and E. an isolating mechanism for spatially isolating the incident window and the emitting window from the position adjustment mechanism.
Description
technical field [0001] The present disclosure relates to wavelength conversion devices for laser devices. Background technique [0002] With the miniaturization and high integration of semiconductor integrated circuits, it is required to increase the resolution in semiconductor exposure devices. Hereinafter, the semiconductor exposure apparatus is simply referred to as “exposure apparatus”. For this reason, the shortening of the wavelength of the light output from the light source for exposure is advancing. As a light source for exposure, a gas laser device is used instead of a conventional mercury lamp. Conventionally, as a laser device for exposure, a KrF excimer laser device that outputs ultraviolet rays with a wavelength of 248 nm and an ArF excimer laser device that outputs ultraviolet rays with a wavelength of 193.4 nm are used. [0003] As a current exposure technique, liquid immersion exposure is put into practical use in which the gap between the projection lens ...
Claims
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Patent Timeline

Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/10
CPCH01S3/1643H01S3/1608H01S3/2391H01S3/06754H01S3/1618H01S3/027H01S3/0092H01S3/2316H01S3/2375H01S3/2366H01S3/2251G02F1/353G02F1/3505G02F1/3507H01S3/06758H01S3/109
Inventor 渊向笃若林理佐佐木阳一
Owner AURORA ADVANCED LASER CO LTD
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