23 results about "Exposure technique" patented technology

The utility model discloses a lens device, and belongs to the technical field of exposure. The lens device comprises a collimating mirror assembly, a reflecting mirror assembly, a DMD assembly and a lens assembly, the collimating mirror assembly is assembled on the reflecting mirror assembly, the DMD assembly is assembled on the reflecting mirror assembly and can rotate relative to the reflecting mirror assembly, the lens assembly is assembled on the reflecting mirror assembly, and laser enters the reflecting mirror assembly after being processed by the collimating mirror assembly; and the light is reflected to the DMD assembly through the reflector assembly, is reflected to the lens assembly after being processed by the DMD assembly and is output after being processed by the lens assembly, and finally light spots can be output. The utility model further discloses exposure equipment which comprises the lens device. According to the utility model, the DMD assembly rotates relative to the reflection box so as to realize the adjustment of the light spot angle, and the device has the advantages of easy and convenient operation and the like.

The invention discloses an edge exposure device and an exposure method, and belongs to the technical field of edge exposure. The edge exposure device comprises a feeding assembly, a feeding mechanism is arranged on the inner side of the feeding assembly, a turnover frame is arranged on the side position of the feeding assembly, and exposure frames are connected to the two sides of the top of the turnover frame; according to the invention, in the whole clamping, adsorption and pull-down process, a torque sensor, a first pressure sensor and a tension sensor are integrated in the system, so that the clamping, adsorption and pull-down processes of the two exposure frames are integrated, and the clamping, adsorption and pull-down processes of the two exposure frames are integrated; the multi-sensing-module cooperative monitoring mechanism can accurately control the clamping force, the pushing force and the downward pulling force acting on the glass substrate in real time, so that the problems of upward arching, downward sinking or unstable positioning of the glass substrate caused by improper stress are fundamentally avoided; and the safety and the shape integrity of the thin and brittle substrate in the processing process are greatly guaranteed.

The invention discloses a high-precision circuit board line exposure positioning calibration device, and relates to the technical field of circuit board line exposure, the high-precision circuit board line exposure positioning calibration device comprises a frame body and an exposure module, a top frame is arranged on one side of the top of the frame body, and a calibration assembly used for assisting optical calibration is installed in the top frame; and the calibration assembly comprises a sliding base, a second servo motor, a first lead screw, a threaded block, a second lead screw and a third servo motor, the second servo motor is arranged in the sliding base, and the first lead screw is installed at the output end of the second servo motor. According to the high-precision circuit board line exposure positioning calibration equipment, through the design of the driving adjusting assembly, the positions of the two limiting assemblies can be conveniently exchanged through rotation, a user can conveniently carry out single-face or double-face exposure treatment on a circuit board according to the use requirement, the situation that the user needs to manually adjust the exposure face during double-face exposure is avoided, and when double-face exposure is carried out, the operation is convenient. Wherein one group of limiting assemblies can be synchronously realized when moving downwards to feed the to-be-exposed circuit board.

The invention discloses an exposure device, an exposure system and an exposure method thereof, and relates to the technical field of exposure. The exposure device comprises a rack, a driving mechanism, a light-transmitting plate, a liquid dropping mechanism and a bearing disc, the bearing disc is installed on the rack, the driving mechanism is connected with the light-transmitting plate, the liquid dropping mechanism is installed on the light-transmitting plate, the light-transmitting plate is provided with a receding groove, and the light-transmitting plate and the bearing disc are arranged in a spaced mode; the liquid dropping mechanism is used for enabling the refraction liquid to penetrate through the receding groove and drop onto the bearing disc, the bearing disc is used for bearing the glass sheet, the liquid dropping mechanism is further used for enabling the refraction liquid to penetrate through the receding groove and drop onto the glass sheet, and the driving mechanism is used for driving the light-transmitting plate to be pressed on the glass sheet. The exposure device provided by the invention can cancel a polishing process, is time-saving and labor-saving, shortens the exposure period, improves the exposure efficiency, reduces the exposure cost and improves the economic benefit.

Various embodiments herein relate to methods of using maskless lithography to form layers. In these embodiments, the method implements a dose-varying staircase that divides a geometry into overlay portions. The overlay portions can include different doses for each portion to achieve control of the taper. The taper can be achieved by operating the geometric "mask data" into different dose overlay portions controlled by a pixel blending (PB) exposure technique. To perform the methods described herein, a maskless lithography tool is used. The maskless lithography tool includes a controller that performs software-based "mask data" operations. Because the method is performed masklessly by software without the additional mask cost and manufacturing time, there is greater flexibility to adjust the taper angle and / or photoresist thickness residuals of multi-tone / grey-tone mask features, which is an advantage over traditional lithography methods that use masks.

This utility model relates to the field of photolithography exposure technology and discloses a photolithography exposure layout positioning device, which solves the problems mentioned in the background art. It includes a chip placement stage, sliding components on both sides of the chip placement stage, photolithography exposure elements on the sliding components, and a fluid cooling pipe at the bottom of the chip placement stage. The fluid cooling pipe is laid along the chip placement stage and has an output end and an input end, both of which are connected to a cooling box. A pump body is provided at the connection between the cooling box and the input end. This utility model can significantly reduce the impact of thermal deformation on positioning accuracy, improve the stability of the exposure process, reduce equipment downtime and maintenance costs caused by thermal deformation, and maintain high-precision positioning.

The invention discloses an exposure machine and an exposure method thereof, and belongs to the technical field of exposure. The exposure machine comprises a base, a conveying mechanism, a feeding mechanism, a cleaning mechanism, an exposure mechanism and a discharging mechanism, and the conveying mechanism is movably arranged on the base and can transfer an object from a feeding area to a discharging area through an exposure area; the feeding mechanism is arranged in the feeding area of the base and can store an object to be exposed and place the object to be exposed on the conveying mechanism. The cleaning mechanism is arranged in the feeding area of the base or located between the feeding area and the exposure area and can clean the surface of an object to be exposed. The exposure mechanism is arranged in the exposure area of the base and can perform exposure treatment on the to-be-exposed object in the exposure area; the discharging mechanism is arranged in the discharging area of the base and can pick up the exposed objects from the conveying mechanism and store the exposed objects in a classified mode. The exposure machine integrates the functions of automatic feeding and discharging, automatic cleaning and the like, and can remarkably improve the production efficiency and the exposure quality.

The application discloses a sub-resolution auxiliary pattern exposure model training method and related devices, applied to the technical field of auxiliary pattern exposure, comprising obtaining a printed image formed after sub-resolution auxiliary pattern exposure and extracting a printed contour; the printed contour retains a contour corresponding to the sub-resolution auxiliary pattern; the printed image is grid divided, and a grid is formed on the printed image; a correction scale is arranged in each grid; an area proportion covered by the auxiliary pattern printed contour in each grid is determined based on the correction scale; an initial model is trained with the area proportion as an input value to obtain an exposure model. By dividing the grid in the printed image, the area proportion of the auxiliary pattern printed contour in each grid is calculated, the area proportion is not binary data, and the printed degree of the sub-resolution auxiliary pattern can be accurately represented. The initial model is trained by the area proportion, so that the exposure model after training has higher accuracy.

The application discloses a kind of based on hydrogel direct printing platform and the method for realizing optical image information security, the hydrogel direct printing platform is composed of metal-polyvinyl alcohol-metal three-layer film, using electron beam exposure technology, can directly print out ladder type hydrogel nanometer microcavity, for the generation of structural color;The polyvinyl alcohol layer as a typical hydrogel, can absorb water molecules and swell behavior;The method for realizing optical image information security includes: one-time optical information transmission and optical image hiding.By electron beam exposure technology on hydrogel nanometer microcavity prints out optical image information, when information transmission is completed, can utilize environmental humidity change and destroy information instantly, reach one-time optical information transmission.Further, using relative humidity brings the structural color change of ladder type nanometer microcavity, can realize optical image hiding and decryption.The application can be applied to optical information security, encryption and anti-counterfeiting and the like field.

The utility model discloses a large table-board laser direct imaging exposure device of a printed circuit board, which relates to the technical field of large table-board laser direct imaging exposure of the printed circuit board and comprises a fixed seat, an L-shaped frame is fixedly connected to the middle of the top end of the fixed seat, and an automatic adjusting assembly is fixedly connected to the top end of the inner wall of the L-shaped frame. Sliding strips are fixedly connected to the two sides of the inner bottom wall of the L-shaped frame, a fixing assembly is slidably connected to the inner walls of the sliding strips, the automatic adjusting assembly comprises a fixing frame fixedly connected to the top end of the inner wall of the L-shaped frame, and fixing blocks are fixedly connected to the two sides of the top end of the fixing frame; through the arrangement of the automatic adjusting assembly, when a worker operates the device for use, the servo motor drives the transmission rod and the threaded rod to rotate and drives the sliding block and the sliding plate to linearly move, so that the position of the laser direct imaging exposure machine body can be quickly and accurately adjusted, and the exposure requirements of printed circuit boards with different sizes are met; and the exposure efficiency and precision are greatly improved.

The present application relates to the technical field of exposure, in particular to a quality detection method and a parameter adjustment method based on a microlens array (MLA) exposure process. The quality detection method comprises the following steps: establishing an exposure pattern detection model capable of identifying the category of each exposure point pattern; the pattern category includes qualified patterns and unqualified patterns; setting initial exposure parameters and obtaining an exposure image obtained through the MLA exposure process; inputting the exposure image into the exposure pattern detection model to generate a data information set corresponding to the pattern category of each exposure point; determining the pattern category of the exposure point according to the data information set and counting the number of exposure points of the qualified patterns and the unqualified patterns in the exposure image to obtain the proportion of the number of exposure points of the qualified patterns to the total number of exposure points. Through the above setting, the qualified patterns and the unqualified patterns can be automatically identified, so that the qualified rate of the MLA exposure quality can be automatically obtained, and the quality detection precision and speed are effectively improved.

The invention relates to the technical field of interference exposure, and provides an interference exposure device which comprises a light beam generation unit, a light splitting unit, a working plane and reflection units corresponding to a first light beam and a second light beam. The reflecting unit comprises a reflecting mirror and an adjusting unit, and the incident angles of the two beams of light on the working plane are accurately controlled by adjusting the position of the reflecting mirror, so that the interference included angle and the fringe period can be adjusted, and rapid switching of micro-nano structures of different periods is realized. The reflective optical path is beneficial to maintaining wavefront continuity and interference stability, is matched with precise adjustment to improve alignment precision, repeatability and exposure reproducibility, is convenient to integrate with modules such as light intensity matching and polarization control, and improves process universality and preparation flexibility.

The invention discloses a parallel processing and relay exposure LDI laser direct imaging exposure method and system, and relates to the technical field of photoetching equipment and laser direct imaging exposure, and the method comprises the following steps: collecting layout graphic data, calibrating multiple exposure head coordinates, and generating exposure coordinate reference data according to a calibration result; performing adaptive slicing according to the exposure coordinate reference data, and generating a slice boundary relay overlapping band and a task queue; and distributing the slices to a plurality of exposure heads for parallel exposure according to the task queue, generating an exposure context snapshot in a relay overlapping band, and reading the context snapshot by a connecting rod head for continuous exposure. The method disclosed by the invention has better effects in the aspects of continuity of parallel exposure scheduling, controllability of cross-slice connection and coordinate consistency of multiple exposure heads.

The invention discloses a pixel exposure adjustment method and system, and relates to the technical field of pixel exposure. The method comprises the following steps: acquiring a pixel array of an original image; determining an exposure mode as a single-frame multi-segment exposure mode according to the pixel array and actual requirements; performing single-frame multiple exposure parameter initialization, and adjusting the exposure parameters based on a single-frame multi-segment exposure parameter adjustment method according to the initialized exposure parameters to obtain adjusted exposure parameters; the exposure parameters comprise exposure time and gain; and performing corresponding exposure control on each region of the pixel array based on the single-frame multi-section exposure mode and the adjusted exposure parameters. Compared with an existing scheme, the speed can be increased by two times or more, and the exposure efficiency in a low-power-consumption system is greatly improved.

The application provides an etching deviation acquisition method of a multiple exposure technology, and the method comprises the following steps: providing a first mask and a second mask, wherein the first mask comprises a first pattern and a second pattern, the second mask comprises a third pattern, and the second pattern and the third pattern are superimposed to form a fourth pattern; acquiring a simulated post-development line end spacing of the first pattern and the fourth pattern; performing a first photolithography process to acquire a post-development line end spacing of the first pattern; performing a second photolithography process, wherein the third pattern and the second pattern are superimposed to form a fourth pattern on the wafer, and an etched line end spacing of the fourth pattern is acquired; and acquiring an etching deviation based on the simulated post-development line end spacing of the first pattern and the fourth pattern, the post-development line end spacing of the first pattern and the etched line end spacing of the fourth pattern. The technical scheme of the application can make the etching deviation of the line end spacing more accurate in the length direction.

In imaging systems, automatic exposure (AE) control adjusts scene exposure to place the subject of interest in an image, such as a human face, within a predefined brightness range. Single-exposure AE techniques may struggle to simultaneously lift dark subjects and preserve highlight details, especially in high dynamic range or backlit scenes. An effective AE control technique can compute a target brightness for the subject in a manner that is tone-mapping-aware and noise-aware. The target brightness can be used to derive an exposure setting for the image. The result is comparable to pipelines relying on fusing multiple exposures. The technique lifts dark subjects to a target brightness while preserving highlight detail, providing an efficient and practical solution for real-time imaging on single-exposure sensors.

This invention discloses a flexible, transferable vortex laser device and its fabrication method. A two-dimensional grating periodic structure is obtained using a two-beam interferometry exposure technique. A mixed solution of polymer material MDMO-PPV and toluene solution is selected as the gain material to fabricate the vortex laser device. The fabricated device is then immersed in a developer to remove all photoresist from a glass substrate. This results in a flexible, transferable vortex laser device, promoting the wider application of vortex beams in daily life and production.

The invention relates to the technical field of exposure, and particularly provides an exposure light machine homogenization lighting device and method, the device comprises a laser, a light dissipater and a light homogenizer, the laser is used for emitting target laser; the light dissipater is arranged on one side of the laser and is used for receiving the target laser, homogenizing the target laser and outputting first homogenized light; the light homogenizer is arranged on one side of the light dissipater and comprises a collimation piece, a digital micromirror device and a miniature lens; the collimation piece is used for receiving the first homogenized light, performing collimation and secondary homogenization processing on the first homogenized light, and outputting second homogenized light entering the digital micromirror device in the middle; the digital micromirror device is used for spatially modulating the second homogenized light and outputting target pattern light; the miniature lens and the digital micro-mirror device are sequentially arranged at intervals, and the miniature lens is used for receiving the target pattern light and conducting focusing processing so that the target pattern light can be projected to the surface of the target workpiece. The homogenizing effect is effectively improved, and the local light intensity peak of the laser is eliminated.

This invention discloses a lens device, belonging to the field of exposure technology. The lens device includes a collimating lens assembly, a reflecting mirror assembly, a DMD assembly, and a lens assembly. The collimating lens assembly is mounted on the reflecting mirror assembly. The DMD assembly is mounted on the reflecting mirror assembly and can rotate relative to the reflecting mirror assembly. The lens assembly is mounted on the reflecting mirror assembly. Laser light, after being processed by the collimating lens assembly, enters the reflecting mirror assembly and is reflected by the reflecting mirror assembly to the DMD assembly. After processing by the DMD assembly, the light is reflected to the lens assembly, processed by the lens assembly, and then output, ultimately producing a light spot. This invention also discloses an exposure device including the above-described lens device. This invention achieves adjustment of the light spot angle by rotating the DMD assembly relative to the reflecting box, offering advantages such as ease and convenience of operation.

The invention discloses a manufacturing method of a micro lens and a micro lens structure, and the manufacturing method of the micro lens comprises the steps: providing a substrate, and forming a photoresist layer with a preset thickness on the surface of the substrate; based on a target micro lens, carrying out one-time gray exposure on the photoresist layer through an electron beam gray exposure technology, and forming a gradient cross-linked structure matched with the curvature of the target micro lens in the photoresist layer; developing and forming a micro-lens surface type corresponding to the gradient cross-linked structure; and transferring the surface type of the micro lens to the substrate through an etching technology to form a target micro lens. According to the manufacturing method of the micro lens and the micro lens structure, accurate manufacturing of the high-performance micro lens can be achieved.

The invention provides a preparation method of a grid electrode of a pHEMT device and the pHEMT device. The method comprises the following steps: providing an epitaxial wafer; coating the surface of the wafer with positive photoresist, and performing soft baking on the wafer coated with the photoresist by using a hot plate; based on a bifocal plane exposure technology, adjusting the focusing depth and the exposure quantity through a focal length energy matrix to carry out secondary exposure; and baking and developing the wafer after the secondary exposure so as to prepare a target gate on the wafer, the line width of the target gate being less than 100 nm. By applying the DFE technology to pHEMT grid photoetching, compared with a traditional single exposure process, the method has a larger process window and can realize better grid morphology; an electron beam photoetching device of a KRF line or an ArF line is used for exposing an irradiation pattern, the grid line width smaller than the limit resolution of a photoetching machine is obtained, and the photoetching technology with the size smaller than 100 nm is achieved.

Examples of the present disclosure describe systems and methods for using machine learning (ML) to predict optimal exposure technique for acquiring mammographic images. In aspects, training data may be collected from one or more data sources. The training data may comprise sample data of patient attribute data and sample image attribute data, image metadata, image pixel data, and / or exposure technique parameters. The training data may be used to train an ML model to determine the optimal exposure technique parameters for acquiring mammographic images of a patient. After the ML model has been trained, patient data that is collected from a patient during a patient visit may be provided as input to the ML model. The ML model may output optimal exposure technique parameters for the patient in real-time. The real-time output of the ML model may be used to generate one or more mammographic images of the patient.