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Photoresist processing system

A processing system and photoresist technology, which is applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as defects, inability to be easily recycled, and back-sticking of stripped objects, and achieve the effect of reducing the probability of defects

Active Publication Date: 2020-03-03
TAIZHOU GUANYU TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, during the removal process, these undegraded strips will be suspended in the photoresist stripper and drift around. In addition to being unable to be easily recycled, it is more likely to cause the strips to stick back on the substrate again, which in turn makes subsequent processes Defects are generated, so a photoresist processing system is needed to solve this problem

Method used

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  • Photoresist processing system
  • Photoresist processing system
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Embodiment Construction

[0016] The following disclosure provides many different embodiments, or examples, of different means for implementing the disclosure. Specific examples of components and configurations are described below to simplify the present disclosure. Of course, these are examples only and are not intended to be limiting. For example, in the following description a first member is formed over or on a second member may include embodiments in which the first member and the second member are formed in direct contact, and may also include embodiments in which additional members An embodiment may be formed between the first member and the second member so that the first member and the second member may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and / or letters in various instances. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and / or configurations discussed.

[0...

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Abstract

A photoresist processing system for processing a magnetic photoresist carried by a substrate, including a holding device and a magnetic device is disclosed. The holding device includes at least one combining section arranged to hold the substrate; the magnetic device is positioned on a specific position away from the combining section, wherein a magnetic field generated by the magnetic device hasa magnetic effect on the photoresist.

Description

technical field [0001] The invention relates to a photoresist processing system, in particular to a photoresist processing system for lifting photoresist off a substrate. Background technique [0002] Traditionally, in many industrial processes, such as semiconductor processes, photoresist is usually used to generate the desired structure pattern, and in the subsequent steps, the patterned photoresist is usually used to remove the patterned photoresist from the substrate. ) on stripping. However, during the removal process, these undegraded strips will be suspended in the photoresist stripper and drift around. In addition to being unable to be easily recycled, it is more likely to cause the strips to stick back on the substrate again, which in turn makes subsequent processes Defects are generated, so a photoresist processing system is needed to solve this problem. Contents of the invention [0003] One of the objectives of the disclosed embodiments of the present inventi...

Claims

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Application Information

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IPC IPC(8): H01L21/027
CPCH01L21/0273H01L21/0272
Inventor 黄立民翁光祥
Owner TAIZHOU GUANYU TECH CO LTD
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