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Method for manufacturing silsesquioxane compound

A technology of silsesquioxane and manufacturing method, which is applied in the direction of silicon organic compounds, can solve the problems of hydrogen chloride generation, and achieve low-cost effects

Inactive Publication Date: 2020-04-17
RESONAC CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, chlorosilanes have problems such as immediate generation of hydrogen chloride by reacting with water, which is difficult to deal with

Method used

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  • Method for manufacturing silsesquioxane compound
  • Method for manufacturing silsesquioxane compound
  • Method for manufacturing silsesquioxane compound

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0102] Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited by these examples.

[0103] The structure and purity of the obtained compound are used as needed 1 H NMR, 13 C NMR, 29 Si NMR and 19 F NMR was confirmed by NMR. The measurement conditions are as follows, respectively.

[0104] ( 1 H NMR)

[0105] Device type: Avance300 (manufactured by Bruker)

[0106] Observation core: 1H

[0107] Resonance frequency: 300MHz

[0108] Measurement temperature: 25℃

[0109] ( 13 C NMR)

[0110] Device type: Avance300 (manufactured by Bruker)

[0111] Observation core: 1H

[0112] Resonance frequency: 75MHz

[0113] Measurement temperature: 25℃

[0114] ( 29 Si NMR)

[0115] Device type: Avance300 (manufactured by Bruker)

[0116] Resonance frequency: 60MHz

[0117] Measurement temperature: 25℃

[0118] ( 19 F NMR)

[0119] Device type: Avance300 (manufactured by Bruker)

[0120]...

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Abstract

Provided is a method for manufacturing a silsesquioxane compound, comprising manufacturing a silsesquioxane compound represented by general formula (III), the method having a step for reacting a compound represented by general formula (I) and a compound represented by general formula (II). In general formulas (I) through (III): R1 and R2 each independently represent hydrogen, a C1-8 alkyl group, aC6-14 aryl group, an aminoalkyl group, an amino-group-containing group, a nitrile-group-containing group, a vinyl-group-containing group, a (meth)acryloyl-group-containing group, a chloro-group-containing group, a bromo-group-containing group, or a functional group including a boron trifluoride complexed amino group; R3 through R10 each independently represent a C1-8 alkyl group or a C6-14 aryl group; and M represents at least one type of element selected from the group consisting of hydrogen, lithium, sodium, and potassium.

Description

technical field [0001] One embodiment of the present invention relates to a method for producing a silsesquioxane compound. Background technique [0002] As a compound obtained by hydrolyzing and condensing an organosilicon compound having three hydrolyzable groups, there are known compounds represented by (RSiO 1.5 ) n The silsesquioxanes shown. Since it has a chemical structure that can be said to be an intermediate state between silicone resin and glass, and has excellent characteristics such as heat resistance, transparency, and weather resistance, it has attracted attention as an optical, semiconductor, or electronic material, and many studies have been reported. . [0003] Among the silsesquioxanes, a random structure without a specific structure, a double-layer structure with a definite structure, a ladder structure, and a cage structure are known. Although all have excellent properties, when used as a resin modifier, aggregation may occur in the mixed resin, maki...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07F7/21
CPCC07F7/21
Inventor 田中彻海野雅史
Owner RESONAC CORPORATION