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A kind of preparation method of red flag mark for deep space probe

A deep space detector and marking technology, applied in the direction of instruments, flags/flags, coatings, etc., can solve problems such as cracks and shedding, reduce degradation, improve the ability to resist electron radiation and ultraviolet radiation, The effect of suppressing the generation and propagation of microcracks

Active Publication Date: 2021-06-15
HARBIN INST OF TECH
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Problems solved by technology

[0003] In order to solve the problem that the existing deep space detector marks are prone to cracks, degeneration, degradation, or even fall off in the extreme environment of deep space, the present invention provides an anti-cold and heat alternation, anti-electron radiation, anti-atomic oxygen, Ultraviolet radiation-resistant and vacuum low-pollution marking for deep space detectors and preparation method thereof

Method used

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  • A kind of preparation method of red flag mark for deep space probe

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specific Embodiment approach 1

[0025] (1) Preparation of POSS-CNT-ZnO

[0026] Dissolve 10 parts by mass of octaphenyl-POSS in 50 parts by mass of tetrahydrofuran, add 2 parts by mass of carbon nanotubes (CNT) under magnetic stirring conditions, and then ultrasonically treat for 1 h. After completion, transfer the solution to a three-necked flask. Under the protection of nitrogen, reflux at 80° C. for 12 h, cool to room temperature after the reaction, filter with suction, wash with distilled water, and dry to obtain POSS-CNT.

[0027] Then put the POSS-CNT into the mortar and grind until the particle size is 50nm, put it into the deposition chamber of the atomic layer deposition instrument, and pump the deposition chamber to 5×10 -3 Torr, and then inject nitrogen gas until the chamber pressure is 0.15Torr; at the same time, keep the temperature in the deposition chamber at 150°C, perform periodic atomic layer deposition growth on the surface of POSS-CNT, and repeat 230 growth deposition cycles to obtain POS...

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Abstract

The invention discloses a method for preparing a red flag mark for deep space probes, and belongs to the technical field of aerospace material preparation. The invention solves the problems that the existing marks for deep space detectors are prone to cracks, degradation or even falling off under the extreme environment of deep space. Based on the organic / inorganic hybrid system and interface control theory, the present invention prepares POSS-CNT-ZnO ternary composite functional filler, uses the filler to modify cyanate resin to prepare coating, and applies it to the extreme space of deep space The external identification of the detector in the environment. Each component in the coating exhibits a good synergistic effect through the process of charge transfer and heat transfer at the interface, which significantly improves the mechanical stability and radiation resistance of the coating. The modified cyanate ester coating prepared by the present invention is a mark for deep space detectors that integrates resistance to alternating cold and heat, electron radiation, atomic oxygen, ultraviolet radiation and low vacuum pollution. The coating preparation method It can also be widely used in the protection of exposed parts of detectors.

Description

technical field [0001] The invention relates to a preparation method of a red flag mark for a deep space probe, and belongs to the technical field of aerospace material preparation. Background technique [0002] Installing markings on spacecraft has become a common practice for space launch missions in various countries. With the development of deep space exploration in a more profound direction, higher requirements are placed on the performance of materials used for spacecraft marking. Compared with the operating environment of traditional near-Earth space spacecraft, the deep space environment is more harsh, with alternating cold and heat in a wide temperature range from -180°C to 180°C, as well as strong degradation ability of electron irradiation and strong oxidation. These harsh environments will lead to cracks, degradation, degradation, or even shedding of the markings on the spacecraft, which will not only lose the display function of the markings, but will even caus...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09D179/04C09D7/62G09F17/00
CPCC08L2201/08C09D179/04C09D7/62C09D7/70G09F17/00G09F2017/0033C08K9/08C08K9/02C08K3/041
Inventor 吴晓宏秦伟卢松涛李杨
Owner HARBIN INST OF TECH
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