Device and method for calibrating multiplying power of light path system of direct-writing lithography equipment

Abstract

The invention relates to a device and a method for calibrating multiplying power of a light path system of direct-writing lithography equipment. The device comprises a lifting system, a sliding rod system, a switching system and a camera system. The sliding rod system comprises an X-direction sliding rod assembly and a Y-direction sliding rod assembly. The X-direction sliding rod assembly comprises an X-direction sliding rod 1 and an X-direction sliding rod 2. The Y-direction sliding rod assembly comprises a Y-direction sliding rod 1 and a Y-direction sliding rod 2. The X-direction sliding rod1, the X-direction sliding rod 2, the Y-direction sliding rod 1 and the Y-direction sliding rod 2 comprise sliding rod main bodies and fixing assemblies arranged at two ends of the sliding rod main bodies. The switching system comprises a switching block 1, a switching block 2, a switching block 3 and a switching block 4. The camera system comprises a camera 1, a camera 2, a camera 3 and a camera4. In the invention, a plurality of cameras with fixed position relations are adopted to replace an original high-precision motion platform, calibration multiplying power cost is reduced, a problem that the multiplying power of an optical path system cannot be calibrated offline is solved, and the device and the method are suitable for multiplying power calibration in different environments and have characteristics of a reasonable structure, compact layout, strong coupling and the like.

Description

technical field [0001] The invention relates to the technical field of direct writing lithography, in particular to a device and method for calibrating the magnification of the optical path system of direct writing lithography equipment. Background technique [0002] The optical system is the core component of direct writing lithography equipment, and the accurate calibration of the magnification of the optical system is the prerequisite for testing other performances of the optical system. The existing method of calibrating the magnification is to change the position of the high-precision three-degree-of-freedom motion platform, and the camera system collects the calibration points at different positions of the optical path system, and calculates the system magnification. Among them, the precision of the magnification of the optical path system is required to be 0.0001, so a high-precision three-degree-of-freedom motion platform is required. However, this kind of platform ...

AI Technical Summary

Problems solved by technology

[0003] The object of the present invention is to provide a device and method for calibrating the magnification of the optical path system of a direct-writing lithography equipment. The device and method replace the original high-precision motion platform with a plurality of cameras with fixed positional relationships, reducing the cost of calibrating the magnification , and solve the problem that the magnification of the optical path system cannot be calibrated offline, it is suitable for magnification calibration in different environments, and has the characteristics of reasonable structure, compact layout, strong coupling, etc.

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