Rotary etching device and rotary etching method for high-precision ultrathin glass

A technology of ultra-thin glass and etching device, which is applied in the field of high-precision ultra-thin glass rotary etching device, which can solve problems such as low surface quality and increased thickness deviation, and achieve the effect of improving fingerprint recognition performance

Active Publication Date: 2020-06-16
CHENGDU TOMI SHUANG DU OPTOELECTRONICS CO LTD
View PDF7 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, due to the thickness of the glass substrate, when the amount of glass etching increases, the etching conditions in each area are different due to the solution flowing from top to bottom and the injection pressure deviation of the etching solution, which eventually leads to increased thickness deviation and poor surface quality. and other shortcomings

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Rotary etching device and rotary etching method for high-precision ultrathin glass
  • Rotary etching device and rotary etching method for high-precision ultrathin glass
  • Rotary etching device and rotary etching method for high-precision ultrathin glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0052] Figure 4 A schematic diagram showing a process description of a spin etching method for high-precision ultra-thin glass according to an exemplary embodiment of the present invention,

[0053] Such as Figure 4 As shown, the basket with several fixtures (with glass substrates) fixed in the rotatable fixed frame of the CST tray is rotated in the etching area or cleaning area where the etching solution or cleaning solution is sprayed from the top, so that the The glass substrate is etched to less than 0.1mm to produce high-precision ultra-thin glass, which is suitable for the manufacture of foldable mobile phones, rollable mobile phones, cover glass for OLED lighting, and substrates for OLED, TFT, and MicroLED.

[0054] First, the jig #5 with the glass substrate #4 to be etched attached is inserted into the basket #3 and the jig is locked to prevent the jig from being separated or flowing out from the basket. Then install the basket on the rotatable fixed frame of the C...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a rotary etching device and rotary etching method for high-precision ultrathin glass, wherein the device comprises clamps used for loading glass substrates, a basket used for fixing a plurality of clamps loaded with the glass substrates, a CST tray is used for mounting a basket, can greatly move and slightly swing and can control the basket to rotate, and an etching equipment provided with an etching area capable of spraying an etching liquid on the top or two sides of the CST tray and a cleaning area capable of spraying cleaning liquid on the top or two sides of the CST tray. According to the method, the rotary etching device for the high-precision ultra-thin glass is adopted for etching the high-precision ultra-thin glass, the thickness of the high-precision ultra-thin glass is 0.03-0.1 mm, and the thickness deviation is + / -5% of the thickness of the glass. According to the rotary etching device and the rotary etching method, the etching conditions of all surfaces of the glass substrates can be ensured to be the same, the thickness precision is improved, and the surface quality is improved.

Description

technical field [0001] The invention relates to the technical field of ultra-thin glass preparation, more specifically, to a rotary etching device and a rotary etching method for high-precision ultra-thin glass. Background technique [0002] The cover glass of foldable mobile phones needs to use ultra-thin Ultra thin Glass (abbreviated as UTG, which solves the problems of the current cover material CPI). Ultra thin Glass products require precise glass thickness and surface quality. At present, 0.07mm glass can be purchased on the market, but the price is very expensive, and glass thinner than it is not sold. [0003] Therefore, in practice, the thick glass of 0.2-0.4 mm is thinned to an ultra-thin glass of 0.03-0.07 mm for use. The original process used to manufacture thin glass is to first fix the glass substrate on the basket, and then move the basket only to the left and right in the direction of etching for etching. At this time, due to the thickness of the glass subst...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
CPCC03C15/00
Inventor 朴钟先张永强阳利民沈于乔李银姬
Owner CHENGDU TOMI SHUANG DU OPTOELECTRONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products