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Array substrate and preparation method thereof

A technology of an array substrate and a substrate layer, applied in the field of array substrates and their preparation, can solve problems such as multi-mask processes, and achieve the effects of saving mask processes and improving production efficiency

Pending Publication Date: 2020-06-19
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Embodiments of the present invention provide an array substrate and a preparation method thereof, so as to solve the technical problem that many masking processes are required in the preparation process of the array substrate in the existing display panel

Method used

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  • Array substrate and preparation method thereof

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Embodiment Construction

[0061] Please refer to the drawings in the accompanying drawings, wherein the same component symbols represent the same components, the following description is based on the specific embodiment of the invention shown, and it should not be considered as limiting the invention to other specific embodiments not described in detail herein. Example. The word "embodiment" as used in this specification means an example, instance or illustration. Furthermore, as used in this specification and the appended claims, the article "a" or "an" may generally be construed as "one or more" unless specified otherwise or clear from the context in the singular.

[0062] Such as figure 1 As shown, the embodiment of the present invention provides a method for preparing an array substrate, the method comprising:

[0063] Step S1: sequentially forming a semiconductor component, a barrier component, a first insulating layer, a gate, a second insulating layer, and an interlayer insulating layer on the...

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Abstract

The embodiment of the invention provides an array substrate and a preparation method thereof. The preparation method comprises the steps: sequentially forming a semiconductor component, a blocking component, a first insulating layer, a grid electrode, a second insulating layer and an interlayer insulating layer on a substrate layer; performing a photomask process on the first insulating layer, thegate, the second insulating layer, and the interlayer insulating layer with a combination of a predetermined mask and the blocking component, and performing etching to form a first through hole, a second through hole, and a groove on the first insulating layer, the gate, the second insulating layer and the interlayer insulating layer; arranging metal layers in the first through hole, the second through hole and the groove to form a source electrode, a drain electrode and a metal component; and forming a planarization layer which is arranged on the interlayer insulating layer and covers the groove.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an array substrate and a preparation method thereof. Background technique [0002] AMOLED (Active-matrix organic light-emitting diode, active-matrix organic light-emitting diode) display panel has become an outstanding representative of the next-generation display technology due to its advantages of thinness, flexibility, and wearability. In order to improve the bending performance of the bending area of ​​the AMOLED display panel, at present, the most common method is to use multi-step etching to remove the inorganic film layer in the bending area of ​​the array substrate in the AMOLED display panel. The film layer is replaced to improve the bending performance of the AMOLED display panel. [0003] However, the above method requires 11 masking processes to be realized, the technical process is cumbersome, and the production efficiency is low. [0004] Therefore, it is necessa...

Claims

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Application Information

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IPC IPC(8): H01L21/84H01L29/417H01L27/12H01L27/32
CPCH01L27/1288H01L27/1262H01L27/1218H01L27/124H01L29/41733H10K59/1213H10K59/131H10K59/1201H10K2102/311H10K77/111H10K59/124
Inventor 白思航
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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