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Negative photoresist and preparation method thereof

A negative photoresist and resin technology, which is applied in the field of negative photoresist and its preparation, can solve problems such as insufficient curing, and achieve the effects of improving curing level, good UV curing performance, and improving curing level

Pending Publication Date: 2020-06-26
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] An object of the present invention is to provide a preparation method of negative photoresist, which can solve the problem of insufficient curing of negative photoresist materials in the prior art

Method used

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  • Negative photoresist and preparation method thereof
  • Negative photoresist and preparation method thereof

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Embodiment Construction

[0025] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0026] The terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of said features. In the description of the present application, "plurality" means two or more, unless otherwise specifically defined.

[0027] The following disclosu...

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Abstract

The invention discloses a negative photoresist and a preparation method thereof. The negative photoresist contains at least two long-chain resins, the long-chain resins are intertwined to form an interpenetrating network polymer, and the long-chain resins comprise acrylate and epoxy resin. The acrylate-epoxy resin interpenetrating polymer network has better ultraviolet curing performance than acrylic resin and a better thermal curing level than epoxy resin.

Description

technical field [0001] The present application relates to the field of mobile display panels, in particular to a negative photoresist and a preparation method thereof. Background technique [0002] The color filter substrate (ColorFilter, CF) in the composition of TFT-LCD panels is composed of multiple processes such as black matrix, RGB color resist layer, PS, and ITO. In the process of preparing the color filter substrate, the traditional technology is to use photolithography to complete the preparation of each process. The production method is as follows: First, use negative photoresist to coat and form a film, first go through a pre-baking process, and then go through a photomask for an exposure process. The exposed part reacts with a curing developer and is retained after the development process. The final pattern is obtained through a post-baking process. [0003] Among them, negative photoresists such as black matrix and RGB color resist layer have a certain degree ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/038
CPCG03F7/038
Inventor 刘雪
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD