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Dust-containing gas treatment apparatus

A technology for gas treatment and dust, applied in the direction of brush body, liquid separation agent, brush, etc., can solve the problems of unsmooth treatment and achieve reliable treatment effect

Active Publication Date: 2020-07-31
CLEAN TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, most of the conventional dust-containing gas treatment devices are aimed at treating relatively low-concentration dust-containing gas, such as waste gas discharged from semiconductor manufacturing equipment, and cannot handle high-concentration dust-containing gas. Issues that are handled smoothly

Method used

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  • Dust-containing gas treatment apparatus

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Embodiment Construction

[0034] Next, an embodiment of the dust-containing gas treatment device of the present invention will be described based on the drawings.

[0035] exist figure 1 The figure shows the first embodiment of the dust-containing gas treatment device of the present invention.

[0036] The dust-containing gas treatment device is used to remove dust from the dust-containing gas, and has: a cylindrical, preferably cylindrical treatment chamber 1, which introduces the dust-containing gas into the treatment chamber 1, and removes the dust from the gas; Collective 2, the trapping body 2 is arranged in the processing chamber 1, traps the dust contained in the gas, and is composed of a brush with bristles 22 planted on the supporting body 21; the liquid spreading mechanism 3, the liquid spreading mechanism 3. Arranged in the processing chamber 1; the storage part 5 of the liquid, the storage part 5 of the liquid has the stirring body 4 formed in the lower part of the processing chamber 1; T...

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Abstract

Provided is a dust-containing gas treatment apparatus capable of treating smoothly a gas including dust at a high concentration. The apparatus includes of a tubular treatment chamber (1) for introducing a gas including dust and removing dust from the gas, a collector (2) which is disposed in the treatment chamber (1) and which is made of a brush in which bristles (22) are implanted in a support body (21) for collecting dust contained in the gas, a liquid scattering mechanism (3) disposed in the treatment chamber 1, a liquid reservoir (5) provided with a stirring member (4) formed in the lowerpart of the treatment chamber (1), a rotary drive mechanism (6) for rotating the collector (2) and the stirring member (4), a gas introducing section (7) for introducing the gas including dust into the treatment chamber (1), a gas discharging section (8) for discharging the gas from which dust has been removed from the treatment chamber (1), and a liquid discharging section (9) for discharging liquid including dust removed from the gas.

Description

technical field [0001] The present invention relates to a dust-containing gas treatment device for removing dust from dust-containing gas. Background technique [0002] Conventionally, as a dust-containing gas treatment device for removing dust from a dust-containing gas, various dry-type and wet-type devices have been proposed (for example, refer to Patent Documents 1 and 2). [0003] However, most of the conventional dust-containing gas processing devices are aimed at processing relatively low-concentration dust-containing gas such as waste gas discharged from semiconductor manufacturing equipment. Issues that are handled smoothly. [0004] prior art literature [0005] patent documents [0006] Patent Document 1: Japanese Patent Laid-Open No. 2000-140546 [0007] Patent Document 2: Japanese Patent Application Publication No. 4-65114 Contents of the invention [0008] The problem to be solved by the invention [0009] In view of the above-mentioned problems of the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D47/06A46B13/02B01D47/00
CPCA46B13/02B01D47/00B01D47/06B01D45/14A46B2200/30F24F8/133B03C3/014
Inventor 淡路敏夫
Owner CLEAN TECH CO LTD