Manufacturing process of crystal array probe with sensitive position
A technology of crystal array and manufacturing process, which is applied in the fields of nuclear physics, medical imaging, and safety inspection. It can solve the problems of crystal array accuracy defects, the impact of nuclear radiation measurement accuracy, and the consistency of crystal light output, so as to achieve consistent output signals. Good performance, huge commercial application value, and small position error
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[0030] In order to make the purpose, technical solutions and advantages of the present invention clearer, the following technical solutions in the present invention are described clearly and completely. Obviously, the described embodiments are some embodiments of the present invention, rather than all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present invention.
[0031] The invention provides a position-sensitive crystal array probe manufacturing process, including a CsI (Tl) crystal array, a multi-anode position-sensitive photomultiplier tube H8500C, and a four-way readout circuit board designed by a DCP bridge circuit, wherein the CsI (Tl) crystal array The processing method is:
[0032] Step 1. Use a high-precision cutting machine to slice the large-sized bulk crystal material, and draw a CsI(Tl) crystal array with a parallelism bett...
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