Method and device for generating face confrontation patches

A patch and face image technology, applied in character and pattern recognition, biological neural network models, image enhancement, etc., can solve problems such as poor robustness, difficulty in achieving attack effects, and reduced similarity, achieving strong aggressiveness, Improve versatility and robustness

Active Publication Date: 2020-11-13
ALIPAY (HANGZHOU) INFORMATION TECH CO LTD
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the existing methods, the adversarial patch is closely dependent on the attacker's face image. Once the attacker collects his own photos with poor quality, the generated adversarial patch will be significantly reduced when used as long as there are slight changes in position and illumination. The similarity, poor robustness, it is difficult to achieve the expected attack effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for generating face confrontation patches
  • Method and device for generating face confrontation patches
  • Method and device for generating face confrontation patches

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0101] According to an implementation manner, the face set acquisition unit 62 is configured to:

[0102] Obtain an alternative face image;

[0103] Using the target recognition model to calculate the similarity between the candidate face image and the attacker image;

[0104] If the similarity is less than a preset threshold, the candidate face images are classified into the face image set.

[0105] According to one embodiment, the first loss function is also negatively correlated with a first distance, where the first distance is the distance between the current adversarial patch and the initial adversarial patch.

[0106] According to an embodiment, the first loss function further includes a regularization term, and the regularization term represents the absolute size of the image parameters in the current adversarial patch.

[0107] In one embodiment, the first optimization unit 63 is configured to:

[0108] In the direction in which the first loss function decreases, d...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The embodiments of this specification provide a method and device for generating a face confrontation patch. In this method, an initial adversarial patch is obtained first, and then a face image set that does not contain the attacker's face image is obtained. Then, use each face image in the face image set to perform the first round of optimization on the initial adversarial patch to obtain the first adversarial patch; the first round of optimization makes each face image with the patch superimposed with the target person The similarity between face images is increased. Then, on the basis of the first adversarial patch, the second round of optimization is performed on the patch, so that the similarity between the attacker's image and the target face image with the superimposed patch increases, and the similarity between the attacker's own image and the attacker's own image decreases .

Description

technical field [0001] One or more embodiments of this specification relate to the field of machine learning, and in particular to a method and device for generating an adversarial patch for adversarial training of a face recognition model. Background technique [0002] With the large-scale application of face recognition models, attacks against models emerge in an endless stream. It is necessary to follow up research in time to discover potential attack methods and prevent dangers before they happen. Among many attack methods, adversarial samples are a new type of attack method with strong attack power. Adversarial examples can make the face recognition model output a wrong recognition result with high confidence by adding perturbations that are almost invisible to the naked eye to the original face image. [0003] There are two main ways to attack the face recognition model through adversarial samples. The adversarial samples are generated by perturbing the whole image or...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G06K9/00G06K9/32G06K9/62G06N3/04G06T5/50
CPCG06T5/50G06V40/16G06V40/172G06V10/25G06N3/045G06F18/22G06F18/214
Inventor 傅驰林张晓露周俊
Owner ALIPAY (HANGZHOU) INFORMATION TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products