Semi-automatic agent-adding system and agent-adding method

Abstract

The invention provides a semi-automatic agent-adding system and agent-adding method, wherein the system comprises an input pipe, a pneumatic diaphragm pump, a main output pipe, branching output pipes,and a pressure release pipe. The main output pipe comprises a head end connecting pipe, middle connecting pipes, and a tail end connecting pipe, wherein the head end connecting pipe, the middle connecting pipes, and the tail end connecting pipe are connected in turn. The head end connecting pipe is connected with one of the middle connecting pipes through a first three-way pipe. Each of the middle connecting pipes is connected with each other through a second three-way pipe. One of the middle connecting pipes is connected with the tail end connecting pipe through a third three-way pipe. The tail end connecting pipe is communicated with a first two-way pipe. The head end connecting pipe is communicated with the pneumatic diaphragm pump. The other interface of each of the second three-way pipes, the third three-way pipes, and the two-way pipe is connected with one of the branching output pipes. According to the semi-automatic agent-adding system and agent-adding method, a liquid agent is pumped by the pneumatic diaphragm pump into the branching output pipes. An operator only needs to remove a reservoir at each of the branching output pipes and adds the liquid agent contained in thereservoir into a corresponding equipment for agent adding, so that a semi-automatic agent-adding process is finished, and the degree of automation of agent adding is enhanced.

Description

technical field [0001] The invention belongs to the technical field of dosing devices, in particular to a semi-automatic dosing system and a dosing method. Background technique [0002] At present, in the cleaning of monocrystalline silicon wafers, cleaning agents are usually manually added to the washing machine equipment. Therefore, the degree of automation is low. With the rapid development of the production capacity of monocrystalline silicon wafers, more manpower is required in the process of manually adding cleaning agents. The above two factors inevitably lead to higher labor costs. Contents of the invention [0003] The object of the present invention is to provide a semi-automatic dosing system and a dosing method, the device can realize semi-automatic dosing, improve the degree of automation and reduce labor costs. To achieve the above object, the present invention adopts the following technical solutions: [0004] A semi-automatic dosing system includes a liq...

AI Technical Summary

Problems solved by technology

Therefore, the degree of automation is low

With the rapid development of the production capacity of monocrystalline silicon wafers, more manpower is required in the process of manually adding cleaning chemicals. The above two factors inevitably lead to higher labor costs.

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