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Mask blank, half-tone mask, manufacturing method and manufacturing apparatus

The technology of a halftone mask and a manufacturing method, which are applied in the fields of mask blanks, halftone masks, manufacturing and manufacturing devices, can solve the problem that the deviation of the change of transmittance becomes large, and it is difficult to control the transmittance of the halftone mask to a desired value. and other problems, to achieve the effect of less changes in optical characteristics

Pending Publication Date: 2020-12-01
ULVAC COATING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] However, in this case, if the transmittance change in the cleaning process is too large, the variation in the transmittance change in the cleaning process will also increase.
Therefore, it was found that even in this case, it is difficult to control the transmittance, which is an important characteristic of a halftone mask, to a desired value

Method used

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  • Mask blank, half-tone mask, manufacturing method and manufacturing apparatus
  • Mask blank, half-tone mask, manufacturing method and manufacturing apparatus
  • Mask blank, half-tone mask, manufacturing method and manufacturing apparatus

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0431] First, a semitransmissive halftone film is formed on a glass substrate for forming a mask.

[0432] Here, after forming a film having the same composition ratio of chromium, oxygen, nitrogen, carbon, etc. as conventional, oxidation treatment is performed.

[0433] The halftone film formed at this time is preferably a film containing chromium, oxygen, nitrogen, carbon, and the like. A halftone film having a desired transmittance can be obtained by controlling the composition and film thickness of chromium, oxygen, nitrogen, and carbon contained in the halftone film during film formation and oxidation treatment.

[0434]After that, a metal silicide film is formed as an etching stopper. As the metal silicide film, various films can be used, and in this embodiment, molybdenum silicide is used. At this time, in order to form molybdenum silicide, it can be formed using a reactive sputtering method.

[0435] Molybdenum silicide has the property that it is very easily etched...

experiment example 1

[0454] As Experimental Example 1, a halftone film having the same composition ratio as that of a conventionally used halftone film was formed.

[0455] When the formed halftone film was not oxidized, the composition of the halftone film was evaluated using Auger electron spectroscopy.

[0456] The result is as Figure 19 shown.

[0457] Additionally, it is possible to Figure 19 The halftone film whose composition evaluation is shown in , is set to the base halftone layer 11A described above.

experiment example 2

[0459] As Experimental Example 2, after forming the same halftone film as Experimental Example 1, oxidation treatment was performed using NO gas.

[0460] Also in this case, as in Experimental Example 1, the composition of the halftone film after the oxidation treatment was evaluated using Auger electron spectroscopy.

[0461] The result is as Figure 20 shown.

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Abstract

The invention relates to a mask blank, a half-tone mask, a manufacturing method and a manufacturing device. The mask blank of the present invention includes: a transparent substrate; a half-tone layerlaminated on the surface of the transparent substrate and containing Cr as a main component; an etching stop layer laminated on the half-tone layer; and a light-shielding layer pressed on the etchingstop layer and mainly composed of Cr. The half-tone layer has: a chemical-resistant layer located at the most surface position in the thickness direction, with the composition ratio of oxygen being higher than that of chromium and that of nitrogen; and an optical characteristic layer, located at a position close to the transparent substrate in the thickness direction, with the composition ratio of oxygen being lower than the composition ratio of chromium and the composition ratio of nitrogen, thus ensuring optical characteristics.

Description

technical field [0001] The present invention relates to a technique suitable for use in a mask blank, a halftone mask, a manufacturing method, and a manufacturing apparatus. Background technique [0002] A substrate used in an FPD (flat panel display) such as a liquid crystal display or an organic EL display is manufactured using a plurality of masks. In order to reduce this manufacturing process, it is possible to reduce the number of masks by using a semi-transmissive halftone mask. [0003] In addition, in a color filter or an organic EL display, etc., a spacer or an opening of an appropriate shape can be formed by exposing and developing a photosensitive organic resin using a semi-transmissive mask and controlling the shape of the organic resin. department. Therefore, the importance of halftone masks is increasing (Patent Document 1, etc.). [0004] These halftone masks are formed using a light shielding layer and a halftone layer (semi-transmissive layer). As the st...

Claims

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Application Information

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IPC IPC(8): G03F1/32
CPCG03F1/32
Inventor 诸沢成浩汐崎英治
Owner ULVAC COATING