External hanging type cavity for cleaning arm stained with organic solution and cleaning method

An organic solution and plug-in technology, applied in liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc., can solve the waste of effective running time of equipment, wafers cannot use vacuum arms, equipment transmission is unstable, etc. problem, to achieve the effect of increasing effective running time, avoiding parameter adjustment and equipment loss, and reducing equipment error reporting

Inactive Publication Date: 2020-12-25
NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD
View PDF13 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some wafers with through holes cannot use the vacuum arm, only the physical groove arm
like figure 1 As shown, the organic wet-process semiconductor automation equipment transported by the groove arm is easy to be stained with viscous organic liquid in actual use, which will lead to unstable transmission of the equipment and waste the effective operation time of the equipment.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • External hanging type cavity for cleaning arm stained with organic solution and cleaning method
  • External hanging type cavity for cleaning arm stained with organic solution and cleaning method
  • External hanging type cavity for cleaning arm stained with organic solution and cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] The technical solutions of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0045] The present invention has designed a kind of external hanging cavity that cleans the arm that is stained with organic solution, as figure 2 As shown, it includes a pipeline for spraying isopropanol on the front, a pipeline for spraying deionized water on the front, a pipeline for spraying isopropanol on the back, a pipeline for spraying deionized water on the back, and a pipeline for hot water Nitrogen drying of lines, doors and control modules. The pipeline for spraying isopropanol on the front side and the pipeline for spraying deionized water on the front side spray isopropanol and deionized water to the front of the arm to be cleaned respectively, and the pipeline and the backside spray isopropanol on the back side The pipeline for spraying deionized water sprays isopropanol and deionized water to the back of the arm to be clea...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an external hanging type cavity for cleaning an arm stained with an organic solution and a cleaning method. The externally-hung cavity comprises a pipeline for spraying isopropanol on the front face, a pipeline for spraying deionized water on the front face, a pipeline for spraying the isopropanol on the back face, a pipeline for spraying the deionized water on the back face, a hot nitrogen drying pipeline, a cavity door and a control module, wherein the pipeline for spraying the isopropanol on the front face and the pipeline for spraying the deionized water on the front face respectively spray the isopropanol and the deionized water on the front side of the arm; the pipeline for spraying the isopropanol on the back face and the pipeline for spraying the deionized water on the back face respectively spray the isopropanol and the deionized water on the back face of the arm; the hot nitrogen drying pipeline sprays hot nitrogen to the arm to dry the arm; the control module drives the arm to be cleaned to extend into the cavity door; and the control module controls valves of all the pipelines respectively. According to the external hanging type cavity for cleaning the arm stained with the organic solution and the cleaning method, cleaning and drying of the arm are achieved, and the inherent defects of organic wet method semiconductor automation equipment areovercome.

Description

technical field [0001] The invention belongs to semiconductor automation equipment, in particular to organic wet semiconductor automation equipment transported by grooved arms. Background technique [0002] Organic wet process semiconductor equipment is mainly used to soak wafers with glue. Some wafers have through holes that cannot be used with vacuum arms, only physical groove arms. Such as figure 1 As shown, in the actual use of the organic wet-process semiconductor automation equipment transported by the groove arm, the arm is easily contaminated with viscous organic liquid, which leads to unstable transmission of the equipment and wastes the effective operation time of the equipment. Contents of the invention [0003] In order to solve the technical problems mentioned in the above-mentioned background technology, the present invention proposes an external hanging cavity and a cleaning method for cleaning an arm stained with an organic solution. [0004] In order to...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B3/08F26B21/00
CPCB08B3/02B08B3/08F26B21/001
Inventor 张泽东周健申强苏杭吴文涛
Owner NO 55 INST CHINA ELECTRONIC SCI & TECHNOLOGYGROUP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products