Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Processing circuit for two-dimensional plane displacement measurement

A technology of displacement measurement and processing circuit, which is applied in the direction of measuring device, image data processing, optical device, etc., to achieve high resolution and realize the effect of two-dimensional displacement measurement

Inactive Publication Date: 2020-12-25
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF9 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the development of ultra-precision machining equipment, large-scale CNC machine tools and other equipment, traditional one-dimensional measurement technology can no longer meet the growing measurement needs, and there is an urgent need to develop high-resolution, high-precision two-dimensional displacement measurement technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Processing circuit for two-dimensional plane displacement measurement
  • Processing circuit for two-dimensional plane displacement measurement
  • Processing circuit for two-dimensional plane displacement measurement

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0025] The invention provides a processing circuit for two-dimensional plane displacement measurement. By cooperating with the image type two-dimensional plane displacement measuring device, the measurement of two-dimensional displacement with high resolution can be realized.

[0026] Such as figure 1 As shown, the embodiment of the present invention discloses a principle diagram of an image-type two-dimensional plane displacement measuring device 8 , including: a two-dimensional calibration grating 801 , a reading head 802 , a light source 803 , and an image output connector 804 . The reading head 802 and the light source 803 are respectively located on the upper and lower sides of the two-dimensional calibration grating 801, so as to realize a mutually opposing relationship. On the two-dimensional calibration grating 801, a coded line for ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a processing circuit for two-dimensional plane displacement measurement, and relates to the field of photoelectric displacement precision measurement. An image data receiving module receives image pixel data transmitted by external equipment through an image data receiving connector, and transmits the image pixel data to a code recognition module and a subdivision operationmodule respectively, the code recognition module is used for recognizing and decoding the image pixel data, the subdivision operation module is used for carrying out two-dimensional subdivision operation on the image pixel data, a data integration module is used for receiving the image pixel data recognized, decoded and subdivided by the code recognition module and the subdivision operation moduleand then fusing the data, and a data output module sends the fused data to receiving equipment through a data output connector. Through cooperation with the external equipment, two-dimensional codinginformation of a current measurement position can be accurately identified, high-resolution displacement subdivision is realized based on a sub-pixel-level subdivision algorithm, and high-resolutiontwo-dimensional displacement measurement is further realized.

Description

technical field [0001] The invention relates to the field of photoelectric displacement precision measurement, in particular to a processing circuit for two-dimensional plane displacement measurement. Background technique [0002] Digital displacement measurement is a high-precision measurement technology that integrates optoelectronics and electromechanics. With its advantages of high precision, high resolution, wide measurement range, and easy connection with digital equipment, it has become the key to industrial manufacturing, aerospace, military equipment and other fields. technology. With the increasing development of the manufacturing industry, higher requirements are put forward for digital displacement measurement technology, mainly including: high resolution capability and high measurement accuracy. Therefore, the study of high-resolution and high-precision displacement measurement technology is a hot spot in the field of basic manufacturing research and has import...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/02G06T9/00
CPCG01B11/02G06T9/00
Inventor 于海万秋华赵长海杜颖财
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com