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A detection method and detection device of a wet photoresist device

The technology of a detection method and a detection device, which is applied in the field of optical detection, can solve problems such as the inability to confirm that the liquid has evaporated completely.

Active Publication Date: 2022-02-18
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Limited by the light of the reflective grating and the limited integrated operating area, the thickness of the liquid layer between two bonded parts (such as the grating and the base plate) cannot be detected by traditional aperture tolerance detection methods, so it is impossible to confirm the liquid in the interlayer Is it volatilized

Method used

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  • A detection method and detection device of a wet photoresist device
  • A detection method and detection device of a wet photoresist device
  • A detection method and detection device of a wet photoresist device

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Embodiment Construction

[0053] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0054] figure 1 It is a schematic diagram of a three-dimensional structure of an object to be tested provided by an embodiment of the present invention, figure 2 The schematic diagram of the bonding process between the bottom plate and the functional parts with the volatilization of the liquid layer provided for the embodiment of the present invention, refer to figure 1 and figure 2 , the object to be tested 10 includes a bottom plate 101, a functional part 102, and a liquid layer 103 between the bottom plate ...

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Abstract

The invention provides a detection method and a detection device of a wet photoresist device, which are used to detect an object to be tested. The object to be tested includes a bottom plate, a functional part, and a liquid layer between the bottom plate and the functional part. The layers are volatilized and bonded together. The detection device includes: a light source and a detector. The light source is located on the side of the bottom plate or the bottom surface of the bottom plate. The bottom surface of the bottom plate is the surface of the bottom plate away from the functional parts; the detector is located on the bottom surface of the bottom plate. : Control the light source to emit the first light beam and inject it into the bottom plate; control the detector to receive the light spot reflected by the object to be tested; judge whether there is a liquid layer according to the light spot received by the detector; if the number of light spots received by the detector is greater than two, Then it is determined that there is a liquid layer in the analyte. The invention provides a detection method and a detection device of a wet photoresist device, so as to realize the detection of a liquid layer in an object to be measured.

Description

technical field [0001] Embodiments of the present invention relate to optical detection technology, and in particular to a detection method and detection device for a wet-process photoresist device. Background technique [0002] The measurement stroke requirements of the immersion lithography machine for the planar grating measurement system determine the necessity of using a large-area grating, but high-precision, large-area gratings are difficult to manufacture and high in cost. The small-area grating made of glass is glued to the large-area (glass) base using photoresist technology, making it possible to integrate and use large-area gratings. The essence of photoresist technology is van der Waals force, that is, molecular force bonding. The thickness of the adhesive layer is negligible, and less deformation occurs during the curing process, which can obtain higher precision. The traditional dry photo-adhesive technology is the process of bringing two clean flat surfaces ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01V8/12
CPCG01V8/12
Inventor 刘明放吴萍
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD